Dual Damascene Application - 248nm

DUV52 family is specifically designed to be compatible with ESCAP DUV photoresists and is used in the dual damascene process. Its planarizing characteristics ensure better control of resist thickness over steps to minimize reflective notching and improve CD control.
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DUV112 is the latest product in Brewer Science’s BARC product family line. This product is specifically designed for certain devices that require a BARC with very few defects. DUV112 has demonstrated extremely high resolution, broad resist compatibility, high etch rate, excellent shelf life in normal storage conditions, and processing ease.
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