Metal Application - 365nm
XHRiC is a highly robust product line specifically designed for advanced i-line dry-patterning processes. This optical design, with an n value of 1.84 and a k value of 0.34, exhibits excellent absorbance. These products have been employed in poly, gate, and metallization levels for 0.30-0.35µm design rule devices. With continuous improvements in lithography technologies, 0.25µm feature sizes have been resolved.
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