Metal Application - All
ARC66 is compatible with FujiFilm, JSR, and TOK photoresists. It is designed for use in hardmask processes.
Path: /Products/ARC®/Product Information/193nm Products
XHRiC is a highly robust product line specifically designed for advanced i-line dry-patterning processes. This optical design, with an n value of 1.84 and a k value of 0.34, exhibits excellent absorbance. These products have been employed in poly, gate, and metallization levels for 0.30-0.35µm design rule devices. With continuous improvements in lithography technologies, 0.25µm feature sizes have been resolved.
Path: /Products/ARC®/Product Information/365nm Products