Trench Patterning Application - All
ARC28 anti-reflective coating is specifically formulated to perform with the emerging ArF photoresists. This first minimum material has demonstrated broad resist compatibility with leading photoresists.
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ENSEMBLE ARC is a spin-on organic anti-reflective coating for processes that need efficient low-k dielectric and copper integration in via-first dual damascene processes as well as processes where higher resist etch budget is critical. Resolution: >80nm, gap fill for <0.15nm vias/trenches.
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