Via Printing Application - 193nm

ARC28 anti-reflective coating is specifically formulated to perform with the emerging ArF photoresists. This first minimum material has demonstrated broad resist compatibility with leading photoresists.
Path: /Products/ARC®/ARC Pop-ups/ARC®28

 

ARC29A is a leading anti-reflective coating for 193nm photolithography. This second minimum material is compatible with a broad range of ArF photoresists. It is available in formulations for 200mm and 300mm processes.
Path: /Products/ARC®/Product Information/193nm Products

 

ARC82A is a leading-edge 193nm anti-reflective coating designed for improved depth of focus with advanced ArF photoresists. This second minimum BARC is compatible with FujiFilm, JSR, Sumitomo, and TOK photoresists.
Path: /Products/ARC®/Product Information/193nm Products