Via Printing Application - 193nm
ARC28 anti-reflective coating is specifically formulated to perform with the emerging ArF photoresists. This first minimum material has demonstrated broad resist compatibility with leading photoresists.
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ARC29A is a leading anti-reflective coating for 193nm photolithography. This second minimum material is compatible with a broad range of ArF photoresists. It is available in formulations for 200mm and 300mm processes.
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ARC82A is a leading-edge 193nm anti-reflective coating designed for improved depth of focus with advanced ArF photoresists. This second minimum BARC is compatible with FujiFilm, JSR, Sumitomo, and TOK photoresists.
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