FUJIFILM Lithography Workshop
Brewer Science is once again pleased to co-sponsor the FUJIFILM Electronic Materials 11th Annual Lithography Workshop offered in two locations this year:
September 11-12, 2012
Devero Hotel, Cavenago Di Brianza
September 13-14, 2012
Covering a variety of lithographic applications, the workshop will endeavour to address such areas of shared interest as defectivity control, performance enhancement techniques, cost-effective process solutions, novel materials, etc.
Brewer Science will present:
“DBARC Optimization for KrF and ArF”
“Positive Tone BARC Systems”
Brewer Science is a co-author of the following talk to be given by IMEC:
“Evolution in Temporary Wafer Bonding and Thinning: From Thermal to Room Temperature Debonding”
To register, please contact Lucie Devos at Lucie_Devos@fujifilm-ffem.com before September 1, 2012.