SPIE Advanced Lithography

San Jose Convention Center and San Jose Marriott
San Jose, CA

Brewer Science will present the following at SPIE Advanced Lithography:

Point-of-use filter membrane selection, start-up, and conditioning for low-defect photolithography coatings
Paper: 8682-73 • Tuesday, 26 February 2013 • 6:00 PM– 8:00 PM

Evaluating spin-on carbon materials at low temperatures for high wiggling resistance
Paper: 8685-26 • Tuesday, 26 February 2013 • 6:00 PM-8:00 PM

Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning
Paper: 8680-61 • Wednesday, 27 February 2013 • 6:00 PM-8:00 PM

Visit us at Booth 217
Conference web site