Sep 3, 2014 to Sep 5, 2014

Join Brewer Science at SEMICON Taiwan!
Being a leader in the industry, Dr. Douglas J. Guerrero, Sr. Technologist at Brewer Science will present how utilizing a graphoepitaxy flow for directed self–assembly (DSA) processing with a neutral layer coating is essential for achieving successful microphase separation of the block copolymer (BCP) at the Litho/Mask Technology Symposium.

Meet our experts at Booth 571 to explore our Advanced Lithography, Thin Wafer Handling, and Low-Volume Production Equipment innovations.

New Materials for Extending DSA Capabilities

SEMICON Taiwan 2014 Litho/Mask Technology Symposium
New Materials for Extending DSA Capabilities
Presented By: Dr. Douglas J. Guerrero
TWTC Nangang Exhibition Hall, Taipei
Friday, September 5, 2014
Room 402 AB, 13:55-14:20