Level® M10 Planarizing Material

Level™ M10 planarizing coating can be used to  planarize high-aspect-ratio structures Level® M10 self-leveling material provides a planar surface when coated over high-aspect-ratio structures. This spin-applied coating offers the following benefits:

  • Facilitates lithography over severe topography
  • Provides a stable surface for application of resists and other thin films
  • Transfers planar surface to underlying organic films by dry etching

Other benefits include:

  • Spin-applied from a coating solution with high solids to limit shrinkage and promote good filling properties
  • Thermally reflowed prior to curing to improve surface planarity
  • Utilizes fast UV curing
  • Provides stable surface for application of resists and other thin films
  • Removable by plasma ashing

Level® M10 planarizing coating is used to planarize high-aspect-ratio structures