Level^® M10 Planarizing Coating

Level^® M10 self-leveling material provides a planar surface when coated over high-aspect-ratio structures. This spin-applied coating offers the following benefits:

• Facilitates lithography over severe topography
• Provides a stable surface for application of resists and other thin films
• Transfers planar surface to underlying organic films by dry etching

Other benefits include:

• Spin-applied from a coating solution with high solids to limit shrinkage and promote good filling properties
• Thermally reflowed prior to curing to improve surface planarity
• Utilizes fast UV curing
• Provides stable surface for application of resists and other thin films
• Removable by plasma ashing

Level^® M10 planarizing coating is used to planarize high-aspect-ratio structures