Brewer Science, Inc.: Publications

Brewer Science, Inc.® takes an active role in disseminating information about some of our technology developments and other business topics to the industry at large. Our technology contributions are found not only in the products that we develop but also in the technical publications we have written, which are listed below.

2008

J. Dalvi-Malhotra, X.F. Zhong, and C. Planje, "Photosensitive etch protection coating for silicon wet-etch applications," Proceedings of SPIE, vol. 6884, 2008, pp. 68840J-1 - 68840J-8.
J. Dalvi-Malhotra, X.F. Zhong, C. Planje, G. Brand, and K. Yess, "A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of silicon," Journal of Micromechanics and Microengineering, vol. 18, no. 2, 2008, pp. 025029-1 - 025029-8.
Douglas J. Guerrero, Carol Beaman, Rikimaru Sakamoto, Takafumi Endo, and Bang-Ching Ho, "Organic underlayers for EUV lithography," Journal of Photopolymer Science and Technology, vol. 21, no. 3, 2008, pp. 451-455.
Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, and Ramil Mercado, "Anti-reflective coating for multipatterning lithography," Proceedings of SPIE, vol. 6923, 2008, in press.
Runhui Huang and Michael Weigand, "Plasma etch properties of organic BARCs," Proceedings of SPIE, vol. 6923, 2008, in press.
Joyce Lowes, Ramil Mercado, Jim Meador, Chris Cox, and Douglas Guerrero, "Novel developer-soluble anti-reflective coatings for 248-nm lithography," ISTC2008, Proceedings of the 7th International Conference on Semiconductor Technology, 2008, pp. 255-259.
Jim D. Meador, Carol Beaman, Charlyn Stroud, Joyce A. Lowes, Zhimin Zhu, Douglas J. Guerrero, Ramil-Marcelo L. Mercado, and David Drain, "Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography," Proceedings of SPIE, vol. 6923, 2008, in press.
Charles J. Neef, Jim Finazzo, Cheryl Nesbit, and Michael Weigand, "Effects of bake temperature and surface modifications on hardmask materials for trilayer applications," Proceedings of SPIE, vol. 6923, 2008, in press.
Rama Puligadda and Doyle Edwards, "High-performance adhesives facilitate ultrathin wafer handling," Future Fab International, vol. 24, 2008, pp. 107-110.
Wu-Sheng Shih, Jiro Yota, and Ketan Itchhaporia, "CON-TACT planarization process of spin-on dielectrics for device fabrication," Journal of the Electrochemical Society, vol. 155, no. 4, 2008, pp. G65-G71.
Sam X. Sun, Brian A. Smith, and Anwei Qin, "Wet trimming process for critical dimension reduction," Proceedings of SPIE, vol. 6923, 2008, in press.
Zhimin Zhu, Emil Piscani, Kevin Edwards, and Brian Smith, "Reflection control in hyper-NA immersion lithography," Proceedings of SPIE, vol. 6924, 2008, in press.

2007

J. Dalvi-Malhotra, G.J. Brand, and X.-F. Zhong, "Use of silane-based primer on silicon wafers to enhance adhesion of edge-protective coatings during wet etching: Application of the TALON WrapTM process," Proceedings of SPIE, vol. 6462, 2007, pp. 64620B-1 - 64620B-7.
Douglas J. Guerrero, Joyce Lowes, and Ramil Mercado, "Organic monolayer determination on semiconductor substrates," Journal of Photopolymer Science and Technology, vol. 20, no. 3, 2007, pp. 339-343.
Xuliang Han and Daniel C. Janzen, "Characterization of carbon nanotube thin films formed using electronic-grade carbon nanotube aqueous solutions," Proceedings of SPIE, vol. 6838, 2007, pp. 683811-1 - 683811-5.
Xuliang Han, Daniel C. Janzen, Jarrod Vaillancourt, and Xuejun Lu, "Printable high-speed thin-film transistor on flexible substrate using carbon nanotube solution," Micro & Nano Letters, vol. 2, no. 4, 2007, pp. 96-98.
Wenbin Hong, Rama Puligadda, Alex Smith, Dongshun Bai, Stefan Pargfrieder, Chad Brubaker, and Sarah Pfeiffer, "High-temperature adhesives for temporary wafer bonding using a sliding approach," IMAPS 2007: Proceedings of the International Microelectronics and Packaging Society 40th International Symposium on Microelectronics, November 11-15, 2007, pp. 1035-1040.
Runhui Huang, Dan Sullivan, Anwei Qin, and Shannon Brown, "Advanced developer-soluble gap-fill materials and applications," Proceedings of SPIE, vol. 6519, 2007, pp. 65192T-1 - 65192T-8.
Joseph L. Lenhart, Daniel Fischer, Sharadha Sambasivan, Eric K. Lin, Wen-Li Wu, Douglas J. Guerrero, Yubao Wang, and Rama Puligadda, "Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface," Applied Surface Science, vol. 253, no. 9, 2007, pp. 4166-4175.
Ramil-Marcelo L. Mercado, Joyce A. Lowes, Carlton A. Washburn, and Douglas J. Guerrero, "A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography," Proceedings of SPIE, vol. 6519, 2007, pp. 65192X-1 - 65192X-10.
Charles J. Neef and Deborah Thomas, "A new wet-developable BARC for 248-nm applications," ISTC2007, Proceedings of the 6th International Conference on Semiconductor Technology, 2007, pp. 709-714.
Charles J. Neef and Deborah Thomas, "A novel 248-nm wet-developable BARC for trench applications," Proceedings of SPIE, vol. 6519, 2007, pp. 65192Z-1 - 65192Z-8.
Menxing Ouyang, Mandy L.Y. Sin, Gary C.T. Chow, Wen J. Li, Xuliang Han, and Daniel C. Janzen, "DEP-Based Fabrication and Characterization of Electronic-Grade CNTs for Nano-Sensing Applications," Proceedings of the 7th IEEE International Conference on Nanotechnology, August 2-5, 2007.
Stefan Pargfrieder, Paul Kettner, Markus Wimplinger, and Rama Puligadda, "Ultrathin-wafer processing utilizing temporary bonding and debonding technology," ISTC2007, Proceedings of the 6th International Conference on Semiconductor Technology, 2007, pp. 878-888.
Rama Puligadda, Sunil Pillalamarri, Wenbin Hong, Chad Brubaker, Markus Wimplinger, and Stefan Pargfrieder, "High-performance temporary adhesives for wafer bonding applications," Materials Research Society Symposium Proceedings, vol. 970, 2007.
Yanli Qu, Mengxing Ouyang, Wen J. Li, and Xuliang Han, "CNTs as ultra-low-powered aqueous flow sensors in PDMS microfluidic systems," Proceedings of the 1st IEEE Conference on Nano/Molecular Medicine and Engineering (IEEE-NANOMED), August 6-9, 2007.
J.J. Senkevich, B.W. Woods, J.J. McMahon, and P.-I. Wang, "Thermomechanical properties of Parylene X, a room-temperature chemical vapor depositable crosslinkable polymer," Chemical Vapor Deposition, vol. 13, no. 1, 2007, pp. 55-59.
Wu-Sheng Shih, Jiro Yota, and Ketan Itchhaporia, "CON-TACT® planarization process of spin-on dielectrics for device fabrication," ECS Transactions, vol. 6, no. 3, 2007, pp. 501-522.
Wu-Sheng Shih, Jiro Yota, Hao Ly, Ketan Itchhaporia, and Alex Smith, "Planarization process for transparent polyimide coatings to reduce topography and overburden variation," Technical Digest, Austin, TX: CS MANTECH conference, May 14-17, 2007, pp. 195-198.
A. Smith, R. Puligadda, W. Hong, T. Matthias, C. Brubaker, M. Wimplinger, and S. Pargfrieder, "High temperature–resistant spin-on adhesive for temporary wafer mounting using an automated high-throughput tooling solution," Technical Digest, Austin, TX: CS MANTECH conference, May 14-17, 2007, pp. 29-32.
Daniel M. Sullivan, Runhui Huang, Shannon Brown, and Anwei Qin, "New developer-soluble gap-fill material," ISTC2007, Proceedings of the 6th International Conference on Semiconductor Technology, 2007, pp. 61-70.
Ramachandran K. Trichur and Xie Shao, "A photosensitive, spin-applied masking material for through-silicon via formation for wafer-level packaging," International Wafer-Level Packaging Conference (IWLPC) Proceedings, no. 09, September 17-19, 2007.
Stephen Turner, "Rework/stripping of multilayer materials for FEOL and BEOL integration using single wafer tool techniques," Proceedings of SPIE, vol. 6519, 2007, pp. 65192Q-1 - 65192Q-9.
Marc Weimer, Yubao Wang, Charles J. Neef, James Claypool, Kevin Edwards, and Zhimin Zhu, "Materials for and performance of multilayer lithographic schemes," Proceedings of SPIE, vol. 6519, 2007, pp. 65192S-1 - 65192S-8.

2006

Nickolas L. Brakensiek, Gary Martin, Sean Simmons, and Traci Batchelder, "Reducing bottom anti-reflective coating (BARC) defects: Optimizing and decoupling the filtration and dispense process," Proceedings of SPIE, vol. 6153, 2006, pp. 874-880.
Gary J. Brand and Ramachandran K. Trichur, "A method for edge protection of wafers during wet etching by application of TALON™ wrap process," Commercialization of Micro and Nano Systems Conference (COMS) 2006, August 27-31, 2006, unnumbered.
Chris Cox, Curtis Planje, Nick Brakensiek, Zhimin Zhu, and Jonathan Mayo, "Microlens formation using heavily dyed photoresist in a single step," Proceedings of SPIE, vol. 6153, 2006, pp. 1378-1384.
Jyoti Dalvi-Malhotra, "Environmentally friendly i-line anti-reflective coating with reduced formaldehyde content," Polymeric Materials: Science and Engineering, vol. 95, 2006, pp. 1113-1114.
Joe Graber, Ryan Buschjost, Mary Ann Hockey, and Ed Brandenburg, "Enhancing the performance of conformal i-line bottom anti-reflective coating products," ISTC2006, Proceedings of the 5th International Conference on Semiconductor Technology, Pennington, NJ: The Electrochemcial Society, 2006, pp. 644-654.
Douglas J. Guerrero, Ramil Mercado, Carlton Washburn, and Jim Meador, "Photochemical studies on bottom anti-reflective coatings," Journal of Photopolymer Science and Technology, vol. 19, no. 3, 2006, pp. 343-347.
Douglas J. Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, and Tomoyuki Enomoto, "Two-layer anti-reflection strategies for implant applications," Proceedings of SPIE, vol. 6153, 2006, pp. 242-249.
Xuliang Han, "Characterization of carbonaceous impurity level in as-produced single-walled carbon nanotubes by using solution-phase spectrophotometry," IEEE-Nano 2006, July 17-20, 2006, pp. 636-639.
Xuliang Han, "Evaluation of carbonaceous impurities in as-produced single-walled carbon nanotubes by solution-phase spectrophotometry," Proceedings of the 1st IEEE International Conference on Nano-/Micro-Engineered and Molecular Systems (IEEE-NEMS 2006), January 18-21, 2006, pp. 1491-1493.
Xuliang Han, Daniel C. Janzen, Jarrod Vaillancourt, and Xuejun Lu, "A flexible thin-film transistor with high field-effect mobility by using carbon nanotubes," Proceedings of the IEEE Nanotechnology Materials and Devices Conference (IEEE-NMDC 2006), October 22-25, 2006, pp. 296-297.
Runhui Huang, "Study of iso/dense bias of BARCs and gap-fill materials on via wafers," Proceedings of SPIE, vol. 6153, 2006, pp. 829-836.
Jim Meador, Carol Beaman, Joyce Lowes, Carlton Washburn, Ramil Mercado, Mariya Nagatkina, and Charlyn Stroud, "Development of 193-nm wet BARCs for implant applications," Proceedings of SPIE, vol. 6153, 2006, pp. 854-863.
C.J. Mitchell, G.-R. Yang, and J.J. Senkevich, "Adhesion aspects of poly(p-xylylene) to SiO₂ surfaces using γ-methacryloxypropyltrimethoxysilane as an adhesion promoter," Journal of Adhesion Science and Technology, vol. 20, no. 14, October 2006, pp. 1637-1647.
Robert Morford, Wu-Sheng Shih, and JoElle Dachsteiner, "Press-patterned UV-curable high refractive index coatings," Proceedings of SPIE, vol. 6123, 2006, pp. 1-11.
S. Pillalamarri, R. Puligadda, C. Brubaker, M. Wimplinger, and S. Pargfrieder, "High-temperature spin-on adhesives for temporary wafer bonding," IMAPS 2006: Proceedings of the International Microelectronics and Packaging Society 39th International Symposium on Microelectronics, October 8-12, 2006, pp. 105-111.
Anwei Qin, Daniel M. Sullivan, and Runhui Huang, "New developer-soluble gap-fill material with fast plasma etch rate," Proceedings of SPIE, vol. 6153, 2006, pp. 881-888.
Jay J. Senkevich, Brad Carrow, and Pei-I Wang, "Thermal and dielectric stability of Parylene X," Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects: Materials Research Society Symposium Proceedings, vol. 914, 2006, pp. 101-106.
J.J. Senkevich, B.W. Woods, B.P. Carrow, R.D. Geil, and B.R. Rogers, "Amorphous highly conjugated chemical-vapor-deposited polymer thin films," Chemical Vapor Deposition, vol. 12, no. 5, 2006, pp. 285-289.
A. Smith, J. Moore, and B. Hosse, "A chemical and thermal resistant wafer bonding adhesive simplifying wafer backside processing," CS MANTECH: 2006 International Conference on Compound Semiconductor Manufacturing Technology Digest of Papers, April 24-27, 2006, pp. 269-271.
J. Vaillancourt, X. Lu, X. Han, and D.C. Janzen, "High-speed thin-film transistor on flexible substrate fabricated at room temperature," Electronics Letters, vol. 42, no. 23, November 9, 2006, pp. 1365-1366.
Carlton Washburn, Nick Brakensiek, Alice Guerrero, Kevin Edwards, Charlyn Stroud, and Nicki Chapman, "Wet-recess process optimization of a developer-soluble gap-fill material for planarization of trenches in trench-first dual damascene process," Proceedings of SPIE, vol. 6153, 2006, pp. 815-820.
Carlton Washburn, Alice Guerrero, Ramil Mercado, Douglas Guerrero, and Jim Meador, "Process development for developer-soluble bottom anti-reflective coatings (BARCs)," INTERFACE 2006: Proceedings of the 43rd Microlithography Symposium, October 29-31, 2006.
Carlton Washburn, Ramil Mercado, Douglas Guerrero, and Jim Meador, "Controlling CD and process window limits for implant patterning," Solid State Technology, vol. 49, no. 10, October 2006, pp. 53-56.
Xiang-Long Xing, Ji-Wei Jiao, Mark Daffron, Yue-Lin Wang, and Hyung Choi, "Contact planarization of sacrificial photoresist for MEMS application," Journal of Functional Materials and Devices, vol. 12, no. 2, April 2006, pp. 135-138, 154.
Gu Xu, Rakesh R. Nambiar, and Frank D. Blum, "Room-temperature decomposition of 2,2'-azobis(isobutyronitrile) in emulsion gels with and without silica," Journal of Colloid and Interface Science, vol. 302, no. 2, 2006, pp. 658-661.

2005

Nickolas L. Brakensiek and Ryan Long, "Throughput increase by adjustment of the BARC drying time with coat track process," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 1102-1107.
Nickolas L. Brakensiek, Peng Zhang, Danielle King, and Craig Ghelli, "Advanced rinse process alternatives for reduction of photolithography development cycle defects," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 241-251.
B.P. Carrow, R.E. Murray, B.W. Woods, and J.J. Senkevich, "Poly(ethynyl-p-xylylene), an advanced molecular caulk CVD polymer," Materials Research Society Symposium Proceedings, vol. 863, 2005, pp. 189-194.
James B. Claypool, Marc Weimer, Vandana Krishnamurthy, Wendy Gehoel, and Koen van Ingen Schenau, "New advanced BARC materials for ultra-high NA applications," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 679-689.
M. Daffron, W.-S. Shih, and K. Marler, "CON-TACT® brand planarization and ENSEMBLE* CP dielectric coating: Smoothing out the bumps on the road to 90nm technology and beyond," Proceedings of the 4th International Conference on Semiconductor Technology (ISTC 2005), 2005, pp. 620-629.
Alice F. Guerrero and Mary Ann Hockey, "Process optimization solutions with organic BARC," COMS: 10th International Commercialization of Micro and Nano Systems Conference, August 21-25, 2005, pp. 261-266.
Runhui Huang, Heping Wang, and Anwei Qin, "A new method to characterize conformality of BARC coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 627-635.
Runhui Huang, Carlton Washburn, Anwei Qin, Kevin Edwards, and Charles J. Neef, "Development and process of low dense/iso bias dual damascene materials," Semiconductor Technology: Proceedings of the 4th International Conference on Semiconductor Technology (ISTC 2005, Shanghai, China), sponsored by The Electrochemical Society, March 15-17, 2005, pp. 138-148.
Ramil Mercado, Rebecca Rich, Wu-Sheng Shih, Udayan Senapati, and Doug Holmes, "Press-patterned diffraction gratings on high refractive index polyimide films," Proceedings of SPIE: Integrated Optics: Devices, Materials, and Technologies IX, vol. 5728, 2005, pp. 227-236.
Robert Morford, Doug Holmes, Curt Planje, Gary Brand, Zhimin Zhu, and Aaron Jacobs, "High refractive index polymer coatings," Proceedings of the 14th International Conference on Polymer Optical Fiber, Boston, MA: Information Gatekeepers, Inc., 2005, pp. 65-69.
R.V. Morford, R.L. Mercado, C.E. Planje, and T.D. Flaim, "High refractive index photocurable resins," Proceedings of SPIE: Organic Photonic Materials and Devices VII, vol. 5724, 2005, pp. 34-41.
Earnest Murphy, "Customer process inquiry forms work," Quality Digest, vol. 25, no. 8, August 2005, pp. 56.
Willie Perez, Stephen Turner, Nick Brakensiek, Lynne Mills, Larry Wilson, and Paul Popa, "Hybrid BARC approaches for FEOL and BEOL integration," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 436-448.
Stephen Turner and Lynne Mills, "Applications of spin-on hybrid BARCs for FEOL and BEOL integration," Solid State Technology, June 2005, pp. 75-78.
Andy Waite-Wright, "Industry roadmaps must enable rebirth of innovation," WaferNEWS, July 2005, pp. 17-18.
Yubao Wang, Tony Flaim, Ramil Mercado, Shelly Fowler, Doug Holmes, and Curtis Planje, "Hybrid high refractive index polymer coatings," Proceedings of SPIE: Organic Photonic Materials and Devices VII, vol. 5724, 2005, pp. 42-49.
Carlton Washburn, "Reducing 300 mm wafer coating defects without compromising uniformity," Semiconductor Manufacturing, May 2005, pp. 34-35.
Carlton Washburn, Darron Dippel, and Kevin Edwards, "CD uniformity and bias improvement in the via-first dual damascene process using a developer-soluble gap-fill material," INTERFACE 2005: Proceedings of the 42nd Microlithography Symposium, October 23-25, 2005, pp. 27-1 - 27-7.

2004

Mandar Bhave, Kevin Edwards, Carlton Washburn, Satoshi Takei, Yasushi Sakaida, and Yasuyuki Nakajima, "Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 640-647.
Nick Brakensiek, Kevin Edwards, Paul Williams, and Deng Jian Ping, "Advanced process considerations for BARC and gap fill technology in via-first Dual Damascene integration for sub 0.13-u technology," SEMICON China 2004 SEMI Technology Symposium, March 17-19, 2004.
Nickolas L. Brakensiek, Brian Kidd, Carlton Washburn, and Earnie Murphy, "Wet-Recess Process Optimization of a Bottom Antireflective Coating for the Via-First Dual Damascene Scheme," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 633-639.
Mark Daffron, Wu-Sheng Shih, and Rebecca Rich, "The Use of Modified Processes to Reduce Feature Density Effects Observed During Contact Planarization Processes," Proceedings of the Ninth International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC), 2004, pp. 377-384.
Mark Daffron, Wu-Sheng Shih, Rebecca Rich, JoElle Dachsteiner, and Julie Snook, "The use of CON-TACT(R) brand planarization to improve planarity for shallow trench isolation (STI) applications," SEMICON West 2004: SEMI Technology Symposium, July 14, 2004, pp. 85-92.
Madison Daily, Kim Ruben, Tony Flaim, and Chenghong Li, "ProTEK^TM: A KOH protective coating for MEMS bulk micromachining," Commercialization of Micro and Nano Systems (COMS) Conference Proceedings, 2004, pp. 109-113.
Isabelle Guilmeau, Alice Guerrero, Vincent Blain, Stephanie Kremer, Vincent Vachellerie, Damien Lenoble, Patricia Nogueira, Sebastien Mougel, and Jean-Damien Chapon, "Evaluation of wet-developable KrF organic BARC to improve CD uniformity for implant application," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 461-470.
Liu He, Rama Puligadda, Joyce Lowes, and Michael Rich, "Bottom Anti-Reflective Coatings (BARCs) for 157-nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 648-654.
Runhui Huang, "Via-fill properties of organic BARCs in dual damascene application," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 711-717.
Runhui Huang, Marc Weimer, and Mariya Nagatkina, "A 193-nm Bottom Anti-Reflective Coating with Broad Photoresist Compatibility," INTERFACE 2004: Proceedings of the ARCH Chemicals Microlithography Symposium, September 26-28, 2004, unnumbered.
Yoko Kishi, Katsu Kawabata, Haiying Shi, and Robert Thomas, "Reduction of Carbon-Based Interferences in Organic Compound Analysis by Dynamic Reaction Cell ICP MS," Spectroscopy, vol. 19, no. 9, September 2004, pp. 14-23.
Jim D. Meador, Doug Holmes, Mariya Nagatkina, Rama Puligadda, Denise Gum, Randy Bennett, Sam Sun, and Tomoyuki Enomoto, "New Materials for 193-nm Trilayer Imaging," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 1138-1148.
Ramil Mercado, Yubao Wang, Tony Flaim, William DiMenna, and Udayan Senapati, "Thin-film polyetherimides with controlled refractive indices," Proceedings of SPIE: Organic Photonic Materials and Devices VI, vol. 5351, 2004, pp. 276-283.
Charles J. Neef, Vandana Krishnamurthy, Mariya Nagatkina, Evan Bryant, Michelle Windsor, and Cheryl Nesbit, "New BARC Materials for the 65-nm Node in 193-nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 684-688.
Kimberly Ruben, Tony Flaim, and Chenghong Li, "Polymeric Protective Coatings for MEMS Wet-Etch Processes," Proceedings of SPIE: Micromachining and Microfabrication Process Technology IX, vol. 5342, 2004, pp. 212-220.
Xie Shao, Alice Guerrero, and Yiming Gu, "Taking the wet-developable route to applying BARC in implant layers," Solid State Technology, vol. 47, no. 6, June 2004, pp. 61-64.
Xie Shao, Alice Guerrero, and Yiming Gu, "Wet-Developable Organic Anti-Reflective Coatings for Implant Layer Applications," SEMICON China 2004 SEMI Technology Symposium, March 17-19, 2004.
Wu-Sheng Shih, Charles J. Neef, and Mark G. Daffron, "A Planarization Process for Multi-Layer Lithography Applications," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 664-672.
Y.Q. Wang, M. Curry, E. Tavenner, N. Dobson, and R.E. Giedd, "Ion beam modification and analysis of metal/polymer bi-layer thin films," Nuclear Instruments and Methods in Physics Research B, vol. 219-220, 2004, pp. 798-803.

2003

Nickolas L. Brakensiek, Brian Kidd, Michael Mesawich, Don Stevens, Jr., and Barry Gotlinsky, "Spin-on Bottom Antireflective Coating Defect Reduction by Proper Filter Selection and Process Optimization," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 858-861.
Nickolas L. Brakensiek, Carlton A. Washburn, and Earnest Murphy, "Novel BARC Etchback Process for Via-First Dual Damascene Processes," INTERFACE 2003: Proceedings of the ARCH Chemicals Microlithography Symposium, September 22-23, 2003, unnumbered.
Chris Cox, Darron Dippel, Craig Ghelli, Pat Valerio, Bill Simmons, and Alice Guerrero, "Developer Soluble Organic BARCs for KrF Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 878-882.
Chelladurai Devadoss, Yubao Wang, Rama Puligadda, Joseph L. Lenhart, Erin L. Jablonski, Daniel A. Fischer, Sharadha Sambasivan, Eric K. Lin, and Wen-Li Wu, "Investigation of BARC-Resist Interfacial Interactions," Proceedings of SPIE: Optical Microlithography XVI, vol. 5040, 2003, pp. 912-922.
Tony Flaim, Yubao Wang, and Ramil Mercado, "High Refractive Index Polymer Coatings for Optoelectronics Applications," Proceedings of SPIE: Optical Systems Design 2003, vol. 5250, 2003, pp. 423-434.
Douglas J. Guerrero, Bill DiMenna, Tony Flaim, Ramil Mercado, and Sam Sun, "Dyed red, green, and blue photoresist for manufacture of high resolution color filter arrays for image sensors," Proceedings of SPIE: Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications IV, vol. 5017, 2003, pp. 298-306.
Douglas J. Guerrero and Tonya Trudgeon, "A New Generation of Bottom Anti-Reflective Coatings (BARCs): Photodefinable BARCs," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 129-135.
Liu He, Rama Puligadda, Joyce Lowes, and Michael Rich, "Bottom Anti-Reflective Coatings (BARCs) for 157-nm Lithography," Proceedings of SPIE: Optical Microlithography XVI, vol. 5040, 2003, pp. 1386-1395.
Erin L. Jablonski, Sharadha Sambasivan, Eric K. Lin, Daniel A. Fischer, Chelladurai Devadoss, and Rama Puligadda, "Near edge x-ray absorption fine structure measurements of the interface between bottom antireflective coatings and a model deprotected photoresist," Journal of Vacuum Science and Technology B, vol. 21, no. 6, November-December 2003, pp. 3153-3156.
Vandana Krishnamurthy, Charles J. Neef, and Stephen R. Turner, "Novel Spin Bowl Compatible, Wet Developable Bottom Anti-Reflective Coating for i-Line Applications," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 883-890.
James E. Lamb III, Mark Daffron, Russell Hopper, Marci Whittaker, and Sharon Scott, "Planarizing difficult topographies using contact planarization," Solid State Technology, vol. 46, no. 10, October 2003.
Jeremy W. McCutcheon, "Research on a novel planarization method as an alternative or complement to CMP," Proceedings of the Eighth International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC), 2003, pp. 283-290.
Jim D. Meador, Doug Holmes, William L. DiMenna, Mariya Nagatkina, Michael Rich, Tony Flaim, Randy Bennett, and Ichiro Kobayashi, "193-nm Multilayer Imaging Systems," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 948-959.
Charles Neef, Michelle Fowler, Michelle Windsor, and Cheryl Nesbit, "New Materials for 193-nm BARC Application," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 872-877.
Kelly A. Nowak, "Void Elimination Research in Bottom Anti-Reflective Coatings for Dual Damascene Photolithography," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 891-901.
Wu-Sheng Shih and Mark G. Daffron, "A Novel Planarization Process for Providing Global Planarity for IC Manufacturing," Proceedings of the 2003 International Symposium on Microelectronics, sponsored by the International Microelectronics and Packaging Society (IMAPS), November 18-20, 2003, pp. 813-818.
Mary Spencer, Kim Ruben, Chenghong Li, Paul Williams, and Tony Flaim, "Polymer protective coating for wet deep silicon etching processes," Proceedings of SPIE: Micromachining and Microfabrication Process Technology VIII, vol. 4979, 2003, pp. 79-86.
Heping Wang, Terry Toddy, Stephen Gibbons, and Trisha May, "Development of a Polymer Etch Rate Monitor: Design, Characterization, and Application," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XVII, vol. 5038, 2003, pp. 1012-1018.
Marc Weimer, Vandana Krishnamurthy, Shelly Fowler, Cheryl Nesbit, and James Claypool, "New Material for 193-nm Bottom Anti-Reflective Coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 866-871.
Paul Williams and Xie Shao, "Process Considerations for Organic Bottom Anti-Reflective Coating [BARC] Optimization for Front-End and Back-End-Of-Line Integration," SEMICON China 2003 SEMI Technology Symposium, March 12-14, 2003, pp. 229-238.

2002

Mandar Bhave, Jim Meador, James Claypool, Jill Akers, and Anne Lindgren, "Thin Organic Bottom Antireflective Coatings for 193nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XIX, vol. 4690, 2002, pp. 1074-1084.
Nickolas L. Brakensiek, "Bottom Anti-Reflective Coating Processing Techniques for Via-First Dual Damascene Processes," Proceedings of SPIE: Optical Microlithography XV, vol. 4691, 2002, pp. 927-936.
Nickolas L. Brakensiek, Chris Cox, and Rama Puligadda, "Processing Techniques for Novel BARC Chemistries," Proceedings of SPIE: Advances in Resist Technology and Processing XIX, vol. 4690, 2002, pp. 1043-1051.
James Claypool, Rama Puligadda, Jill Akers, Rikimaru Sakamoto, and Ken-ichi Mizusawa, "Design Considerations for Bottom Antireflective Coating for 157nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XIX, vol. 4690, 2002, pp. 1065-1073.
Douglas J. Guerrero and Tony D. Flaim, "Photosensitive Titania Polymers," Journal of Photopolymer Science and Technology, vol. 15, no. 3, 2002, pp. 447-451.
James E. Lamb III, "Research on a Novel Planarization Method as an Alternative to CMP," SEMI Technical Symposium (STS): Innovations in Semiconductor Manufacturing (SEMICON West 2002), 2002, pp. 171-173.
Charles J. Neef, Vandana Krishnamurthy, and Stephen R. Turner, "Novel spin bowl compatible, wet developable bottom anti-reflective coating for i-line applications," Polymeric Materials: Science and Engineering, vol. 87, 2002, pp. 199-200.
Ram W. Sabnis, Mary J. Spencer, and Douglas J. Guerrero, "Novel organic, polymeric materials for electronics applications," Materials Research Society Symposium Proceedings, vol. 722, Spring 2002, pp. K9.16.1-K9.16.6.
Paul Williams, Xie Shao, and Keith Strassner, "Fundamentals in Bottom Anti-Reflective Coating Design for its Successful Integration into i-Line and DUV Manufacturing," SEMICON China 2002 SEMI Technical Symposium, March 26-27, 2002, pp. T-1 - T-5.
Gu Xu, Jonathan Mayo, Curtis Planje, Lorie Rieken, and Gary Brand, "High Resolution Dyed Color Filter Material for Use in Digital Photography Applications - Cyan, Magenta, and Yellow Color Photoresists," Proceedings of SPIE: Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications III, vol. 4669, 2002, pp. 377-383.

2001

Shreeram Deshpande, Nick Brakensiek, Paul Williams, Kelly Nowak, and Shelly Fowler, "Sub 0.35¬µm i-Line Lithography with New Advanced Bottom Anti-Reflective Coatings Optimized for High Topography and Dual Damascene Applications," Proceedings of SPIE: Lithography for Semiconductor Manufacturing II, vol. 4404, 2001, pp. 354-367.
Shreeram Deshpande, Kelly Nowak, Shelly Fowler, Paul Williams, and Manuel Arjona, "Novel Conformal Organic Anti-Reflective Coatings for Advanced i-Line Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 855-863.
R. Fang, H. Gu, M.J. O'Keefe, T.J. O'Keefe, W.-S. Shih, K.D. Leedy, and R. Cortez, "Spontaneous, non-aqueous electrochemical deposition of copper and palladium on Al and Al(Cu) thin films," Journal of Electronic Materials, vol. 30, no. 4, 2001, pp. 349-354.
Runhui Huang and Ryan Giedd, "Electrical Characterization of an Ion Beam Mixed Metal/Polymer System," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XV, vol. 4344, 2001, pp. 583-588.
Jim D. Meador, Xie Shao, Mandar Bhave, Chris Cox, John Thompson, Deborah Thomas, Stephen Gibbons, Ashley Farnsworth, and Michael Rich, "Improved Crosslinkable Polymeric Binders for 193-nm Bottom Antireflective Coatings (BARCs)," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 846-854.
Rama Puligadda, Runhui Huang, Chris Cox, James E. Lamb III, Manuel Arjona, and James Claypool, "New Fast Etching Bottom Antireflective Coatings for 248nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 829-837.
Ram W. Sabnis, Mario Cazeca, William L. DiMenna, Mary J. Spencer, Douglas J. Guerrero, and Min-Shyan Sheu, "Organic polymeric coatings deposited by plasma enhanced chemical vapor deposition," Journal of Vacuum Science and Technology, vol. 19, no. 6, November-December 2001, pp. 2184-2189.
Xie Shao, Jim Meador, Shree Deshpande, Rama Puligadda, Kenichi Mizusawa, and Shinya Arase, "Recent Progress in Organic Bottom Anti-reflective Coatings," Journal of Photopolymer Science and Technology, vol. 14, no. 3, 2001, pp. 481-488.
Yubao Wang, Xiaoming Wu, Gu Xu, Jim Lamb III, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, and Hiroyoshi Fukuro, "Development of Full-Fill Bottom Anti-Reflective Coatings for Dual Damascene Process," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 838-845.
Paul Williams, Xie Shao, and Keith Strassner, "The Contributions of Organic Anti-reflective Coatings in Modern Optical Lithography," SEMICON China 2001 SEMI Technical Symposium, March 28-29, 2001, pp. G-1 - G-7.
Gu Xu, Tim Limmer, Jo Mayo, Tom Evers, and John Berges, "Novel Photo Sensitive Pigmented Color Filter Materials," SEMICON China 2001 SEMI Technical Symposium, March 28-29, 2001, pp. FF-1 - FF-5.
Tianyue Yu, Philip Ching, Christopher Ober, Shreeram Deshpande, and Rama Puligadda, "Development of a Bond Contribution Model for Structure: Property Correlations in Dry Etch Studies," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 945-951.

2000

George E. Bailey, Nicholas K. Eib, and Earnest C. Murphy, "Progressions in deep ultraviolet bottom antireflective coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XVII, vol. 3999, 2000, pp. 935-948.
Shreeram Deshpande, Xie Shao, James Lamb III, Nick Brakensiek, Joe Johnson, Xiaoming Wu, Gu Xu, and Bill Simmons, "Advancements in Organic Anti-Reflective Coatings for Dual Damascene Processes," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XIV, vol. 3998, 2000, pp. 797-805.
R. Fang, H. Gu, T.J. O'Keefe, M.J. O'Keefe, W.-S. Shih, K.D. Leedy, and R. Cortez, "An alternative metallic seeding technique for subsequent electrochemical deposition of copper onto barrier metals," Advanced Metallization Conference 2000 (AMC 2000), October 2-5, 2000, pp. 137-143.
Jim D. Meador, Xie Shao, Vandana Krishnamurthy, Manuel Arjona, Mandar Bhave, Gu Xu, James Claypool, and Anne Lindgren, "Second-Generation 193-nm Bottom Antireflective Coatings (BARCs)," Proceedings of SPIE: Advances in Resist Technology and Processing XVII, vol. 3999, 2000, pp. 1009-1018.
Benedicte Mortini, Severine Gally, Patrick J. Paniez, Samir Derrough, and Xie Shao, "Investigation of 193 nm resist/organic BARC compatibility and optimization of BARC process conditions," INTERFACE 2000: Proceedings of the ARCH Microlithography Symposium, November 5-7, 2000, pp. 163-173.
W.-S. Shih, J.A.M. Snook, D.J. Guerrero, and M.J. O'Keefe, "Selective deposition of metals for integrated circuits packaging applications," IMAPS International Advanced Technology Workshop on Flip Chip Technology, March 3-5, 2000, unnumbered.
Paul Williams, Alice Martin, Marlene Stroble, Bill Roberts, Frank Goodwin, Lars Vslkel, Axel Fiecke, Sean Trautman, and Jim Lamb III, "Optimization of the planarizing performance of a DUV organic bottom anti-reflective coating for via first dual damascene process: Cooperation to achieve material and process characterization," Proceedings of SPIE: Microlithographic Techniques in Integrated Circuit Fabrication II, vol. 4226, 2000, pp. 160-168.

1999

Hubert Enichlmair, Oliver Stelmaszyk, and Paul Williams, "Optimization of a wet-patterning bottom antireflective i-line coating for both poly gate and metal lithography processes," Proceedings of SPIE: Microelectronic Device Technology III, vol. 3881, 1999, pp. 265-273.
H. Gu, T.J. O'Keefe, M.J. O'Keefe, K.D. Leedy, R. Cortez, R.E. Strawser, and W.-S. Shih, "Spontaneous electrochemical deposition of metals from organic solutions," Electrochemical Society Proceedings: Fundamentals of Electrochemical Deposition and Dissolution, vol. 99-33, 1999, pp. 242-251.
Jim D. Meador, Douglas J. Guerrero, Gu Xu, Xie Shao, Norm Dobson, James Claypool, and Kelly Nowak, "Recent Progress in 193 nm Antireflective Coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XVI, vol. 3678, 1999, pp. 800-809.
Ram W. Sabnis, "Color filter technology for liquid crystal displays," Displays, vol. 20, no. 3, November 1999, pp. 119-129.
R.W. Sabnis, D.W. Rangnekar, and N.D. Sonawane, "2-Aminothiophenes by the Gewald Reaction," Journal of Heterocyclic Chemistry, vol. 36, March-April 1999, pp. 333-345.
Xie Shao, Jim E. Lamb III, James Claypool, Bill Simmons, and Earnie Murphy, "Broadband planarizing anti-reflective coating for i-line, DUV and 193nm microlithographic applications," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XIII, vol. 3677, 1999, pp. 884-894.
Bill Simmons, Joe Johnson, Xie Shao, Shree Desphande, James Lamb III, Paul Williams, and Sharon Scott, "Organic Anti-Reflective Coatings for Dual Damascene Applications," INTERFACE '99: Proceedings of the ARCH Microlithography Seminar, 1999, pp. 183-195.

1998

M. Fang, T. O'Keefe, M. Stroder, W.-S. Shih, M. O'Keefe, R. Strawser, and D. Via, "Maskless direct deposition of copper onto aluminum bond pads for flip chip applications," Materials Research Society Symposium Proceedings, vol. 515, 1998, pp. 85-90.
Douglas J. Guerrero, Jim D. Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, and James E. Lamb III, "Deep Ultraviolet Antireflective Coating with Improved Conformality, Optical Density, and Etch Rate," Proceedings of SPIE: Advances in Resist Technology and Processing XV, vol. 3333, 1998, pp. 228-235.
Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Ilse van Puyenbroeck, Kurt Ronse, James E. Lamb III, and Johan B.C. van der Hilst, "Optimisation of bottom-ARC processes with respect to CD control," Future Fab International, vol. 5, 1998, pp. 205-210.
Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt Ronse, James E. Lamb III, Johan B.C. van der Hilst, and Johannes van Wingerden, "Bottom-ARC optimization methodology for 0.25 um lithography and beyond," Proceedings of SPIE: Optical Microlithography XI, vol. 3334, 1998, pp. 322-336.
R.W. Sabnis, J.W. Mayo, M.D. Stroder, K. Aoba, K. Ema, Y. Sone, T. Nihira, and A. Yanagimoto, "A novel, photosensitive ultrathin black matrix system," Asia Display '98, 1998, pp. 1025-1028.
R.W. Sabnis, M.D. Stroder, R.E. Nichols, E.G. Hays, A. Yanagimoto, Y. Sone, Y. Watanabe, and K. Ema, "High-Optical-Density Ultra-Thin Black-Matrix System," Society for Information Display '98 Symposium Digest, vol. 29, 1998, pp. 548-551.
Heping Wang and Patricia M. Callahan, "Adsorption studies of azo dyes as resonance Raman spectroscopic probes at solid-liquid interfaces," Journal of Chromatography A, vol. 828, December 1998, pp. 121-134.
Paul Williams, Xie Shao, Jim Lamb, Colin Hester, and Tony Flaim, "Fast Etch Anti-Reflective Coating for Sub-0.35¬µm i-Line Microlithography Applications," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XII, vol. 3332, 1998, pp. 518-525.
Gu Xu, Douglas J. Guerrero, and Norman J. Dobson, "New Antireflective Coatings for 193 nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XV, vol. 3333, 1998, pp. 524-531.

1997

Tony D. Flaim and Xie Shao, "Design and Performance of Polymeric Anti-Reflective Coatings for Advanced i-Line Photoresist Processes," Proceedings, 11th International Conference, Photopolymers: Principles, Processes, and Materials, October 6-8, 1997, pp. 323-338.
R.E. Giedd, M.G. Moss, J. Kaufmann, and Y.Q. Wang, "Ion beam modification of polymers," Application of Accelerators in Research and Industry, AIP Conference Proceedings, vol. 392, 1997, pp. 993-996.
Mariya Nagatkina, Paul Williams, Jim E. Lamb III, Joseph A. Raposo, Gunter Elmendorff, and Frank Dohmen, "Organic i-line antireflective coating for sub-half micron wet and dry patterning," INTERFACE '97: Proceedings of the Olin Microlithography Seminar, November 9-11, 1997, pp. 101-117.
Y.Q. Wang, R.E. Giedd, M.G. Moss, and J. Kaufmann, "Inhomogeneous Characterstic of Ion-Implanted Polymers within the Implanted Layer," Application of Accelerators in Research and Industry, J.L. Duggan and I.L. Morgan, eds., New York: AIP Press, 1997, pp. 985-988.

1996

Chang-Ming Dai, Chin-Lung Lin, Shi-Chang Tai, James E. Lamb III, and M. Iida, "Post Exposure Baking Temperature Effect on Resist Profile with Bottom Anti-reflective Coating," Proceedings of SPIE: Optical Microlithography IX, vol. 2726, 1996, pp. 598-607.
Ryan E. Giedd, Y.Q. Wang, Mary G. Moss, and James Kaufmann, "Versatile applications of ion implanted polymers," Materials Research Society Symposium Proceedings, vol. 396, 1996, pp. 305-310.
James Kaufmann, Mary G. Moss, Yongqiang Wang, and Ryan E. Giedd, "Conductive Polymer Films for Microbolometer Applications," Proceedings of SPIE: Infrared Technology and Applications XXII, vol. 2744, 1996, pp. 334-344.
James Kaufmann, Mary G. Moss, Yongqiang Wang, and Ryan E. Giedd, "Suspended Conductive Polymer Bridges from Ion Implanted Polymers," Materials Research Society Symposium Proceedings, vol. 396, 1996, pp. 329-334.
Jonathan W. Mayo, Michael J. Pfeiffer, Michael D. Stroder, Alain Dunand, Stephane Vago, Benedicte Galea, Jim Sedon, Mark Newsham, Brian Martin, Don Perettie, and Ben DeKoven, "Colour Filters for Flat Panel Displays by High Definition Ink Jet Printing," Society for Information Display Euro '96 Proceedings, 1996, pp. 537-540.
Edward K. Pavelchek, Jim D. Meador, Douglas J. Guerrero, James E. Lamb III, Ajit Kache, Manuel doCanto, Timothy G. Adams, David Stark, and Danny Miller, "A Highly Absorbing ARC for DUV Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XIII, vol. 2724, 1996, pp. 692-699.
R.W. Sabnis, J.W. Mayo, M.D. Stroder, E.G. Hays, A. Yanagimoto, Y. Sone, Y. Watanabe, and K. Ema, "A Novel Black Matrix System," Proceedings of Sixteenth International Display Research Conference (IDRC), SID's 16th International Display Research Conference, Euro Display '96, 1996, pp. 240-243.
John Sturtevant, Linda Insalaco, Tony Flaim, Vanada Krishnamurthy, Jim Meador, John Peterson, and Andy Eckert, "Removable Organic Antireflection Coating," Proceedings of SPIE: Advances in Resist Technology and Processing XIII, vol. 2724, 1996, pp. 738-746.
Heping Wang, Gery Armaly, and L. Jeff Myron, "Mobile Phase Modification in Polyamic Acid Molecular Weight Measurement by Gel Permeation Chromatography," Proceedings of the International GPC Symposium '96, September 8-11, 1996, pp. 484-498.

1995

L. Insalaco, V. Krishnamurthy, John Sturtevant, and J. Mitchener, "UV Pretreatments for Improved Etching of Organic ARC Layer," Proceedings of SPIE: Advances in Resist Technology and Processing XII, vol. 2438, 1995, pp. 540-550.
James E. Lamb III, "Organic ARC Anti-Reflective Coating Application within the Microelectronics Industry," Semiconductor Fabtech, no. 2, 1995, pp. 223-227.
Jim Lamb, "Anti-reflective coatings," European Semiconductor, February 1995, pp. 13-15.
J.M. Mayo, M.J. Pfeiffer, and M.D. Stroder, "Optically Transparent Barrier Photoresist," Asia Display '95: Proceedings of the 15th International Display Research Conference, October 16-18, 1995, pp. 717-720.

1994

R.E. Giedd, D. Robey, Y.Q. Wang, M.G. Moss, and J. Kaufmann, "The electronic microstructure in the implant layer of ion implanted polymers," Materials Research Society Symposium Proceedings, vol. 316, 1994, pp. 75-80.
J. Hunninghake, M. Stroder, J. Mayo, G. Brand, and E. Hays, "A Systems Approach to Color Filters for Flat-Panel Displays," SID 94 Digest, 1994, pp. 407-410.
James Lamb, "A customer-supplier partnership resolves manufacturing and defect issues," Solid State Technology, vol. 37, no. 9, 1994, pp. 55.
R.A. Mayanovic, Y. Feng, K.W. Groh, Y. Wang, R.E. Giedd, and M.G. Moss, "Local Structure Surrounding Implanted As+ Ions in Polysulfone Films," Materials Research Society Symposium Proceedings, vol. 321, 1994, pp. 113-116.
Ardavan Niroomand and Elliott Capsuto, "Characterization of an advanced i-line bottom anti-reflecting coating for a 400mm process," INTERFACE '94: Proceedings of the OCG Microelectronic Materials Microlithography Seminar, 1994, pp. 183-195.
Y.Q. Wang, D.S. Robey, R.E. Giedd, and M.G. Moss, "Piezoresistivity in ion implanted polymer films," Materials Research Society Symposium Proceedings, vol. 316, 1994, pp. 349-354.

1993

Y.P. Feng, D.S. Robey, Y.Q. Wang, R.E. Giedd, and M.G. Moss, "Conductivity and stability in ion-implanted polyaniline," Materials Letters, vol. 17, no. 3-4, 1993, pp. 167-170.
James Lamb and Mary G. Moss, "Expanding Photolithography Process Latitude with Organic AR Coatings," Solid State Technology, vol. 36, no. 9, September 1993, pp. 79-83.
Joseph A. Raposo, Vijay P. Singh, John C. McClure, Raymond G. Bell, and Jonathan W. Mayo, "Current transport and aging in direct-current powder electroluminescent display devices," Journal of the Society for Information Display, vol. 1, no. 4, 1993, pp. 397-403.
V.P. Singh, J.A. Raposo, J.C. McClure, R.G. Bell, and J.W. Mayo, "A Study of Modified Structures for Reducing Aging Effects in DCPEL Display Devices," SID 93 Digest, 1993, pp. 859-862.

1992

Gregg A. Barnes, Tony D. Flaim, Susan K. Jones, Bruce W. Dudley, David A. Koester, Charles R. Peters, and Stephen M. Bobbio, "Anti-Reflective Coating for Deep UV Lithography Process Enhancement," Polymer Engineering and Science, vol. 32, no. 21, Mid-November 1992, pp. 1578-1582.
Bruce W. Dudley, Susan K. Jones, Charles R. Peters, David A. Koester, Gregg A. Barnes, Tony D. Flaim, and James E. Lamb III, "Enhancement of Deep UV Patterning Integrity and Process Control Using Anti-Reflective Coating," Proceedings of SPIE: Advances in Resist Technology and Processing IX, vol. 1672, 1992, pp. 638-646.

1991

Gregg A. Barnes, Susan K. Jones, Bruce W. Dudley, David A. Koester, Charles R. Peters, Stephen M. Bobbio, and Tony D. Flaim, "Anti-reflective coating for deep UV lithography process enhancement," Photopolymers: Principles - Processes and Materials, October 28-30, 1991, pp. 259-270.
Tony D. Flaim, Chung-Peng Ho, and Michael J. Pfeiffer, "All-trans polyamic esters as precursors to rigid rod polyimides," Advances in Polyimide Science and Technology, Proceedings of the Fourth International Conference on Polyimides, October 30-November 1, 1991, pp. 213-219.
Ryan E. Giedd, M.G. Moss, M.M. Craig, and D.E. Robertson, "Temperature sensitive ion-implanted polymer films," Nuclear Instruments and Methods in Physics Research [Netherlands], vol. B59/60, 1991, pp. 1253-1256.
S. Sethi, R. Distasio, D. Ziger, J. Lamb, and T. Flaim, "Use of anti-reflective coatings in deep UV lithography," Proceedings of SPIE: Optical/Laser Microlithography IV, vol. 1463, 1991, pp. 30-40.

1990

Yuh J. Uang, Tony D. Flaim, and Frank D. Blum, "W/O microemulsion studies with mono- and dialkyl amic acid surfactants," Journal of Colloid and Interface Science, vol. 139, no. 2, October 15, 1990, pp. 381-391.

1989

T.D. Flaim, G.A. Barnes, and T. Brewer, "A Novel Release Layer System for IC Processing," INTERFACE '89: Proceedings of the Microelectronics Seminar, sponsored by KTI Chemicals, Inc., San Diego, CA, Nov. 6-7, 1989, pp. 363-380.
Tony D. Flaim, Barbara L. Horter, and Mary G. Moss, "Synthesis of Polyamic Esters by Reaction of Polyamic Acid Salts With Alkyl Halides," Polyimides: Synthesis, Characterization and Application, Proceedings of Third International Conference on Polyimides, Ellenville, New York, November 2-4, 1988, C. Feger, M.M. Khojesteh, and J.E. McGrath, eds., Amsterdam: Elsevier Science Publishers, 1989, pp. 279-291.
William J. Latham, Dan W. Hawley, and John J. Gostic, Jr., "High absorptivity organic coatings from transparent precursors," Proceedings of SPIE: Liquid Crystal Chemistry, Physics, and Applications, vol. 1080, 1989, pp. 227-231.
B. Martin, A.N. Odell, and J. E. Lamb III, "Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing VI, vol. 1086, 1989, pp. 543-554.
Mary G. Moss, Ruth M. Cuzmar, and Terry Brewer, "Positive-working polyimide resists based on diazonaphthoquinone photochemistry," Proceedings of SPIE: Advances in Resist Technology and Processing VI, vol. 1086, 1989, pp. 396-405.

1988

Chung-Peng Ho and Mary G. Moss, "Novel High Resolution Imagable Polyimide Siloxane for Electron Beam Lithography," Proceedings of the ACS Division of Polymeric Materials: Science and Engineering, vol. 59, 1988, pp. 1019-1023.
William J. Latham and Dan W. Hawley, "Color Filters from Dyed Polyimides," Solid State Technology, vol. 31, no. 5, May 1988, pp. 223-226.

1987

James E. Lamb III, Donna D. Hawley, and J. Michael Mori, "Spin-On Dry Etch Process for Submicron Lithography," Microelectronic Engineering, vol. 6, December 1987, pp. 85-90.
William J. Latham, Terry L. Brewer, Dan W. Hawley, James E. Lamb III, and Lynn K. Stichnote, "A New Class of Color Filters for Liquid-Crystal Displays," SID 87 Digest, 1987, pp. 379-382.
William J. Latham, Terry L. Brewer, Dan W. Hawley, James E. Lamb III, and Lynn K. Stichnote, "Polyimide Color Filters for Liquid-Crystal Displays," Proceedings of the SID, vol. 28, no. 4, 1987, pp. 385-389.

1986

Chung-Peng Ho, Ruth Cuzmar, Mary G. Moss, Russ Pagel, and Terry Brewer, "Electron-Beam Lithographic Properties of Polyimides," Proceedings of the ACS Division of Polymeric Materials: Science and Engineering, vol. 54, 1986, pp. 741-745.
William J. Latham, "A Black, Patternable Polyimide Coating for Monolithic Optoelectronics Applications," Proceedings of SPIE: Integration and Packaging of Optoelectronic Devices, vol. 703, 1986, pp. 175-179.

1985

Mike Schmidt, "Novel Reverse Osmosis Membranes by Plasma Polymerization," Ultrapure Water, vol. 2, March-April 1985, pp. 28-30.

1983

Richard D. Coyne and Terry Brewer, "Resist processes on highly reflective surfaces using antireflection coatings," INTERFACE '83: Proceedings of the Kodak Microelectronics Seminar, November 14-15, 1983, pp. 40-51.

1981

Terry Brewer, Robert Carlson, and John Arnold, "The Reduction of the Standing-Wave Effect in Positive Photoresists," Journal of Applied Photographic Engineering, vol. 7, no. 6, December 1981, pp. 184-186.