News Articles
"From CD to 3D: sidewall roughness and 3D metrology for sub-90nm lithography and etch."
Grenoble, France - May 3rd, 2005
From CD to 3D: sidewall roughness and 3D metrology for sub-90nm lithography and etch.
Presenter: Serge Tedesco - CEA Leti
Presenter: Serge Tedesco - CEA Leti