65nm node processings ArF Anti-Reflective Coating ARC®29A

Feb 18, 2006

Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings.
 
ArF (193nm) Processing
– Used in the manufacturing of 110nm, 90nm and 65nm node devices
– 2nd minimum reflectivity at 78nm
– 6 months shelf life at 21°C
– Universal ArF photoresist compatibility
– Universal BARC -  Front End & Back End Via Fill applications

ARC29A has been designed for optimal reflectance at second minimum. With the use of ARC29A the user gains broad resist compatibility, better thickness control, better topography coverage and expanded depth of focus. The ARC®29A layer will increase process control by reducing the CD swing effect by normalizing the substrate topography. For more information about the newest 193nm anti-reflective coating, please click here to visit the product page.