Brewer Science Releases ARC®100 Coatings Series

Jan 26, 2007

The ARC®100 coatings series is a new set of ArF bottom anti-reflective coatings (BARCs) from Brewer Science which can be modified to meet specific k-value needs. Tunable-k ARC®100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical requirements needed for optimal substrate reflectivity control.
  • Tunable optical constants: n - 1.67; k - 0.13 to 0.47 (at 193 nm)
  • Broad compatibility with 193-nm photoresist
  • High etch selectivity versus 193-nm photoresist
  • Compatible with typical clean room solvents
  • Very low outgassing during baking
ARC®100 series products exhibit good photoresist compatibility across the range of available k values. Brewer Science, a multidivisional technology company, has pioneered industry-enabling innovations from ARC® anti-reflective coatings to ProTEK® etch protective coatings. Brewer Science is a major producer of high-quality material, process, and machine solutions that meet the stringent requirements of today's IC, compound semiconductor, MEMS, and optoelectronic industries. The company's family of products includes ARC® anti-reflective coatings for state-of-the-art photolithography applications; novel specialty materials for MEMS and optoelectronics; prototype coating services; Cee® benchtop spinners, coaters, and hot plates; and TALON™ track systems for wafer processing.

Under the leadership of Dr. Terry Brewer, president and founder, Brewer Science continues to develop innovative technologies, reliable products, and responsive services, each attuned to the specific needs of individual customers. Further information on the technology and Brewer Science products can be found at www.brewerscience.com.