Brewer Science is pleased to present the following papers at SPIE Advanced Lithography:

Surface property matching for negative-tone developing of a conventional positive-tone photoresist, Paper 7972-26 of Conference 7972, Date: Tuesday, 01 March 2011

Tailorable BARC system to provide optimum solutions for various substrates in immersion lithography, Paper 7972-89 of Conference 7972, Date: Tuesday, 01 March 2011

Filter priming effects on bottom anti-reflective coating defects, Paper 7972-108 of Conference 7972. Date: Tuesday, 01 March 2011

Implementation of KrF DBARCs for implant applications on advanced lithography nodes, Paper 7972-78 of Conference 7972, Date: Tuesday, 01 March 2011