SPIE 2010 Podcast: DBARC and Photoresist Matching

Mar 3, 2010

Carlton Washburn, Technical Product Manager at Brewer Science, gives SST Sr. Technical Editor, Debra Vogler, an update on DBARCs at SPIE 2010. He notes that at the 32nm node, a paradigm shift occurred, whereby implant layers moved from being non-critical to being critical.

Carlton Washburn, Technical Product Manager at Brewer Science, gives SST Sr. Technical Editor, Debra Vogler, an update on DBARCs at SPIE 2010. He notes that at the 32nm node, a paradigm shift occurred, whereby implant layers moved from being non-critical to being critical.

Download or listen to the podcast from the ElectroIQ website.