September 15–16, 2011 • Dresden, Germany

Brewer Science is once again pleased to co-sponsor the FUJIFILM Electronic Materials 10th Annual Lithography Workshop to be held in Dresden, Germany, September 15–16, 2011.

Covering a variety of lithographic applications, the workshop will endeavour to address such areas of shared interest as defectivity control, performance enhancement techniques, cost-effective process solutions, and novel materials. The tentative agenda will include:

• 193-nm top coat-free developments
• 248-nm lithography
• Double patterning integration
• NTD and dry ArF process capabilities
• EUV update
• Low-defect i-line process
• New trends in buffer coats

To register, please download the registration form and return your completed form to Lucie Devos before September 1, 2011.

Hotel room reservation requests are due by August 2, 2011.

We look forward to seeing you in Dresden!

Authors:
Grozdan Grozev (FFEM), Douglas J. Guerrero (BSI)

Title:
“Reflectivity control to enhance resist performance on Si BARC”

Abstract:
Resist performance can be significantly affected by the amount of substrate reflection. In this study we investigated various multilayer systems (Si BARC on spin-on carbon, SOC) having different reflectivities on lithographic parameters such as LWR, Esize, DOF and EL. Simulation was used to predict outcome. In many cases, simulation results match experimental data profiles. Both experimental and simulation results will be presented.