January 27, 2011 – For 30 years Brewer Science has led the world in anti-reflective coatings for semiconductor processes. At SPIE Advanced Microlithography in San Jose, CA, we will introduce lithographic technologies that can bring greater cost efficiency to manufacturers and reduce the time necessary to bring a new device to market.
Brewer Science is pleased to present the following technologies during the SPIE poster session Tuesday, March 1:
Dr. Douglas Guerrero, Senior Technologist at Brewer Science, serves on the Program Committee for Advances in Resist Materials and Processing Technology XXVIII and is a Session Chair for Session 10 of Conference 7972, which will be held on Wednesday, March 2, from 1:30 pm to 3:30 pm and will focus on Novel Materials and Processing.
Visit Brewer Science during SPIE at Booth 225 to learn how our technologies can improve your manufacturing processes.
Brewer Science delivers innovative materials, processing options, and equipment solutions for applications in lithography, advanced packaging, MEMS, nanotechnology, optoelectronics, and compound semiconductors. Our products include ARC® anti-reflective coatings, ProTEK® protective coatings, WaferBOND® temporary bonding materials, OptiNDEX™ high refractive index materials, CNTRENE® electronics-grade carbon nanotube solutions, OptiStack® multilayer lithography systems, and Cee® laboratory-scale processing equipment.
For 30 years, Brewer Science has consistently delivered value to the entire microelectronics industry through our world-class process technologies and exceptional technical expertise. Please visit www.brewerscience.com for further information.