Brewer Science Unveils Unique ARC® 300 Variable Optical Property BARC Series

Mar 7, 2011

February 28, 2011 - Brewer Science, the leading supplier of advanced lithography materials, is pleased to launch the ARC® 300 coating series, a state-of-the-art ArF bottom anti-reflective coating (BARC) series that provides broad photoresist compatibility and variable optical properties. The ARC® 300 coating series is designed to be optimized using Brewer Science’s proprietary OptiStack® lithography simulation software in order to fit the needs of a variety of advanced ArF lithography processes and substrates with a single BARC platform.

In addition to the widely recognized and proven broad resist compatibility of Brewer Science’s ARC® line of products, the unique ARC® 300 coating series also allows for a range of n and k values in a single BARC platform. This advanced new material provides low reflectivities of less than 0.1% for a variety of substrates and film thicknesses. The ARC® 300 coating series is ideal for extending leading-edge ArF dry and immersion processes in both single- and double-patterning lithography schemes.

“ARC® 300 coating series gives lithographers the ability to use a single BARC platform across many different photoresists and substrates,” says Chris Cox, Semiconductor Technology Director for Brewer Science. “This greatly reduces process development time by eliminating the need to pair different BARCs with different substrates. Customers will be able to spend less time searching for a BARC with the correct optical properties and resist compatibility and simply choose the ARC® 300 coating series as a universal BARC solution. The variable n and k values coupled with our OptiStack® simulation software allow for fine-tuning of photoresist profiles and performance. No other product on the market comes close to allowing this level of optical property control.”

ARC® 300 series available n & k values

Brewer Science continuously improves leading-edge lithography products to reduce defectivity and outgassing and increase ease of line integration. For more information about the ARC® 300 coating series and OptiStack® lithography simulation services, please contact Chris Cox, Technology Director, at