The ARC® Division of Brewer Science held a technical Anti-Reflective Coatings '04 Symposium, April 28th, 2004 in Leuven, Belgium. The goal of this symposium was to provide the opportunity to explore technical topics in regard to anti-reflective coatings in the microlithography process.

During the day long conference, eleven industry leaders presented varying topics, ranging from the Keynote from Kurt Ronse, speaking on "The New Lithography Roadmap: Challenges and Issues", to Hung-Wen Lin of Nanya/Infineon talking about the "Challenges of Selecting Bottom Anti-Reflective Coatings" to Madhukar Rao of Air Products & Chemicals talk on "CD Control in Lithography through Surfactant Chemistries".

To access more information about the latest symposium please view this linked page.