February 12 – 16, 2012
San Jose Convention Center and San Jose Marriott
San Jose, California, USA

Brewer Science will present the following technologies during the poster sessions:

How much further can lithography process windows be improved?

Paper 8328-24, Conference 8328 
Tuesday, February 14th, 6:00-8:00 pm, Convention Center, Hall 2
Author(s): Mary Ann Hockey, Brewer Science, Inc. (United States)

EUV assist layers for use in multilayer processes

Paper 8322-85, Conference 8322
Wednesday, February 15th, 6:00-8:00 pm, Convention Center, Hall 2
Author(s): Tanti Ouattara, Carlton Washburn, Aline Collin, Vandana Krishnamurthy, Douglas J. Guerrero, Brewer Science, Inc. (United States)