Brewer Science Presents Innovative Material and Process Technologies Driving Device Fabrication and Performance at SEMICON Taiwan 2013

Aug 13, 2013

August 13, 2013 – Brewer Science, Inc., will present its latest innovative materials, processes, and wafer- processing equipment critical for enabling the advancement of lithography and 3-D IC integration at SEMICON Taiwan 2013 in Taipei, Taiwan. The company will present five different topics at this event. Dr. Terry Brewer, founder and President of Brewer Science, will address materials-driven process development as a new mode for industry collaboration during his keynote speech at the SiP Global Summit 2013 3-D IC Technology Forum on September 5, 2013.

Dr. Brewer explains, “For over 30 years, Brewer Science has consistently delivered many material solutions that have enabled the advancement of lithography processes and the creation of numerous generations of devices. Our proven materials-development expertise has widened process windows to prolong the productive lifetime of lithography equipment while lowering processing cost.” Dr. Brewer continues, “Our 3-D IC and thin-wafer-handling materials are developed to have a similar impact by opening process windows, increasing equipment versatility, and lowering processing costs. By utilizing our long experience with designing materials to increase process windows, it is possible to minimize capital investment and lower cost and time. Any wise investment in equipment sets must be carefully made based on process parameters and performance of the materials. The customer is best served when the customer and the material and equipment manufacturers work in tandem toward a solution.”

Dr. Douglas Guerrero, Senior Technologist at Brewer Science, will discuss extending lithography with advanced materials during the Litho/Mask Technology Symposium on September 6, 2013. Dr. Guerrero explains, “With the continued delay of extreme ultraviolet (EUV) lithography, even more importance is placed on versatile material and process solutions designed to extend existing lithography technology. In this presentation, Brewer Science will discuss how material evolution has been able to extend lithography nodes in the past, present, and future. Recent material innovation for multilayer patterning for positive- and negative-tone development (PTD and NTD), directed self-assembly (DSA), and EUV lithography will be discussed.”

Brewer Science will continue to share its innovative solutions at three TechXPOT sessions on the opening day of SEMICON Taiwan, September 4, 2013. Our technology experts will address advanced lithography and 3-D IC materials, processes, and equipment solutions at the TechXPOT.

Visit Brewer Science during SEMICON Taiwan at Booth 539.

About Brewer Science
Brewer Science is a global technology leader in developing and manufacturing innovative materials, processes, and equipment for the reliable fabrication of cutting-edge microdevices used in electronics such as tablet computers, smartphones, digital cameras, televisions, and LED lighting. Since 1981, when its ARC® materials revolutionized lithography processes, Brewer Science has expanded its technology to include products used in advanced lithography, thin wafer handling, 3-D integration, and chemical and mechanical device protection and products based on carbon nanotubes and nanotechnology. On April 30, 2013, Brewer Science broke ground on a new high-volume manufacturing facility at the Rolla National Airport. This new facility will accommodate product demand growth and demonstrates the company’s commitment to continuous improvement. With its headquarters in Rolla, Missouri, Brewer Science supports its worldwide customers through a service and distribution network in North America, Europe, and Asia.

Learn more about Brewer Science at; follow us on Twitter @BrewerScience, or like us on Facebook.

For more information about this topic, or to schedule an interview, contact:
Dayna Brown
Brewer Science
Tel: (US) +1.573.364.0300, Ext: 1329