Design Considerations for Bottom Anti-Reflective Coating for 157nm Lithography.

Oct 18, 2005

Authors: James B. Claypool, Rama Puligadda, Jill Akers-Brewer Science, R. Sakamoto, K. I. Mizusawa - Nissan Chemical Industries, Ltd. Proceedings: SPIE 2002, Volume 4690, pgs. 1065-1073.