Electron Beam Resist

Oct 31, 2005

Brewer Science now provides PMMA (Polymethyl methacrylate) and Co-polymer resists. PMMA is spin applied and is available in a safe solvent formulation. PMMA is an ebeam resist used for T-gate creation and as a lift off or sacrificial layer. Please click here to view a technical data sheet for PMMA resist.