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EV Group & Brewer Science cooperate in ultrathin wafer handling solution development08/07/2006Contact information: Category: Company Press Releases 2006 American Forest & Paper Association Business Leadership Recycling Award04/12/2006WASHINGTON, DC, April 12, 2006 - The American Forest & Paper Association (AF&PA) today announced that Brewer Science, Inc. of Rolla, Missouri has received the 2006 AF&PA Business Leadership Recycling Award in the large business category. The award recog... Category: Company Press Releases ProTEK™ Temporary Etch Protective Coatings02/20/2006Brewer Science is pleased to announce the development of a new temporary protective coating system for basic etchants which offer customers an alternative to their current wet-etch process materials. ProTEK™ etch protective coatings are spin-applied polymeric coatings designed to give maximum protec... Category: Company Press Releases, SMD Press Releases 65nm node processings ArF Anti-Reflective Coating ARC®29A02/18/2006Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings. Category: ARC® Product Highlight, ARC® Press Releases, Company Product Highlight Brewer Science Raises Awareness for Dr. Norman Dobson02/05/2006Brewer Science will hold a chili luncheon for company employees to solicit scholarship donations and pledges for the Dr. Norman Dobson Memorial Scholarship Fund. The late Dr. Dobson served as Managing Director of Research and Development at Brewer Science and was instrumental in developing a r... Category: Company Press Releases Brewer Science expands R&D facilities to the Jordan Valley Innovation Center12/21/2005Brewer Science will soon have additional quarters for its research and development (R&D) activities. In addition to R&D facilities currently in place at its global headquarters in Rolla, Missouri, Brewer Science will occupy an entire floor (3800 sq.ft.) of the Jordan Valley Innovation Center (... Category: Company Press Releases "From CD to 3D: sidewall roughness and 3D metrology for sub-90nm lithography and etch."10/04/2005Grenoble, France - May 3rd, 2005 Category: Company Press Releases, ARC® Press Releases
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