April 19, 2007 - Brewer Science, Inc., headquartered in Rolla’s Hy-Point Industrial Park, announced an organizational change that will enhance its well-established ability to bring new, creative technologies to market that promote the growth and success of its customers.
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Category: Company Press Releases
Brewer Science, a leading supplier of advanced lithography materials, has released ARC®160, a ArF (193nm) anti-reflective coating that is demonstrating, as POR at large semiconductor fabricators, faster etch and dramatically lower out-gassing in the newer bake module than other ARC®<...
Category: Company Press Releases, ARC® Press Releases
The ARC®100 coatings series is a new set of ArF bottom anti-reflective coatings (BARCs) from Brewer Science which can be modified to meet specific k-value needs. Tunable-k ARC®100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical...
Category: Company Press Releases, ARC® Press Releases
Contact information:
Jim Lamb - jlamb@brewerscience.com, + 573.364.0300
Steven Dwyer – sdwyer@evgroup.com, +1 480.727.9608
EV Group (EVG), based in Schärding, Austria, and Bre...
Category: Company Press Releases
Category: Company Press Releases
Brewer Science is pleased to announce the development of a new temporary protective coating system for basic etchants which offer customers an alternative to their current wet-etch process materials. ProTEK™ etch protective coatings are spin-applied polymeric coatings designed to give maximum protec...
Category: Company Press Releases, SMD Press Releases
Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings.
ArF (193nm) Processing
• Used in the man...
Category: ARC® Product Highlight, ARC® Press Releases, Company Product Highlight