Brewer Science Commercializes the Semiconductor Industry’s First Microelectronics-Grade Carbon Nanotube Coating07/17/2007Brewer Science, a trusted provider of leading-edge materials and processes to the semiconductor industry, announces the commercial availability of the first microelectronics-grade carbon nanotube (CNT) coating. A breakthrough in the refinement of the carbon nanotube material enables the removal of m... Category: Company Press Releases, SMD Publications, SMD Product Highlight New Ultrathin Wafer Handling Solution for the Microelectronics Industry, WaferBOND™HT-25007/17/2007Brewer Science announces successful commercialization of the first generation of yield-improving, polymeric, spin-on WaferBOND™ HT-250 coating. Its use will extend to high-volume device manufacturing the ability to thin wafers and subequently process them. Now higher temperature, advanced pack... Category: Company Press Releases, SMD Press Releases, SMD Product Highlight New Generation Benchtop Spin/Coat/Bake System03/20/2007Brewer Science has introduced three new benchtop processing tools. These new tools come at a time when the performance demands of processing equipment have never been more crucial. In addition to Brewer Science's industry-leading coating and temperature uniformity, advanced user interfaces are now i... Category: Company Product Highlight, CEE® Product Highlight WaferBOND™ Product Set08/06/2006Brewer Science’s WaferBOND™ product set combines a new spin on polymer and a remover and is specially designed for temporary wafer bonding applications. Features include: • Single coat over 10µm Category: SMD Product Highlight, Company Product Highlight Temporary Etch Protective Coatings03/10/2006ProTEK™ Temporary Etch Protective Coatings provide protection for circuit structures during deep silicon wet etching processes such as frontside protection during wafer thinning. Please click here to learn about ProTEK™ Temporary Etch Protective Coatings. Category: SMD Product Highlight, Company Product Highlight 65nm node processings ArF Anti-Reflective Coating ARC®29A02/18/2006Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings. Category: ARC® Product Highlight, ARC® Press Releases, Company Product Highlight ProLIFT™ 100 Lift-off Layers11/09/2005Brewer Science's ProLIFT™ 100 Lift-off layers are a line of polyimides that maintain solubility in positive resist developoers after imidization by baking, but retain high resistance to acid etchants, organic solvents, and high process temperatures. Typical applications for ProLIFT™ lift-off layers ... Category: SMD Product Highlight, Company Product Highlight
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