Brewer Science continues to enable the future by providing integrated solutions for the semiconductor industry. Our processing equipment is engineered to be compatible with an array of applications. The universal design and ingenuity allows our processing equipment to accommodate any market and evolving technology.
Our team of experts has developed an integrated solution that will guide you throughout the process. We offer implementation support and customer service for the life of the tool.Learn More
The Cee® Apogee™ spray/puddle developer provides the highest in precision and quality while maintaining access to in-depth process data and recipe creation methods.
The Brewer Science universal spin chuck base offers the unique ability to seamlessly switch among chuck sizes ranging from 1/8" to 4" in diameter.
The Cee® ApogeeTM precision spin coater delivers track-quality performance with revolutionary interface capabilities.
The Cee® Apogee™ bake plate features a revolutionary intuitive interface, a space-saving design, and track-quality thermal accuracy and uniformity.
Now you can have all the amenities of a controlled clean room environment at your fingertips wherever you need it. We have created the ultimate stand-alone, completely customizable system that will change the way you work.
The Cee® 200DBX precision develop-bake system combines a track-quality precision developer with a high-uniformity bake module (for post-exposure baking) in an efficient space saving design.
The Cee® Model 11 bake plate provides the user with the utmost in thermal accuracy and uniformity.
The Cee® Model 10 bake plate provides the user with repeatable thermal performance in a robust system design for years of reliable operation.
The Cee® 200XD puddle and spray developer delivers track-quality performance, and chemical and process flexibility, in a space saving design.
The Cee® 300X heavy-duty-drive spin coater combines an intuitive Windows®-based operating system, accurate spin speed control, and a high horsepower drive.
The Cee® 300MXD megasonic developer & cleaning system applies uniform acoustic energy to spinning substrates to resolve high-density features.
The Cee® 300XD spray/puddle developer combines accurate spin speed control, and a high horsepower drive for aggressive acceleration.