The 248-nm product line extends the useable life of your KrF lithography equipment into the sub 0.10-µm range for critical dimension.

ESCAP Photoresist Compatible ARC^® Materials

DUV 252 Coating

Brewer Science^® DUV 252 coating is specifically designed to be compatible with ESCAP 248-nm photoresists and for use in the dual damascene process. The planarizing characteristics of DUV 252 coating ensure better control of resist thickness over steps to minimize reflective notching and improve CD control.

DUV 112 Coating

Brewer Science^® DUV 112 coating is specifically designed for certain devices that require a very low defect BARC. DUV 112 coating has demonstrated to have extremely high resolution, broad resist compatibility, high etch rate, excellent shelf life in normal storage conditions and easy to process.

DUV 42S Coating

Brewer Science^® DUV 42S coating is compatible with ESCAP photoresists. DUV 42S utilizes a conformal design and an increased etch rate while optimizing step coverage. DUV 42S coating is optimized to meet the requirements of the < 0.10-µm design rule.

Acetal Photoresist Compatible ARC^® Material

DUV 96 Coating

Brewer Science^® DUV 96 coating is a general purpose 248-nm BARC with a very fast etch rate combined with optical properties that allow thin film reflectivity minimum, together minimizing resist loss to conduct BARC open etch.

DUV 44 Coating

Brewer Science^® DUV 44 coating is designed for < 0.18-µm design rules. DUV 44 demonstrates excellent profiles with a broad range of Acetal photoresists. This product provides a planar, fast etching BARC layer.

*Dependent on application and BARC thickness.

All ARC^® products are PFOS Free, for your health and the safety of the environment.