The Brewer Science 365-nm product line of anti-reflective coatings aids the manufacturer in extending the usability of capital equipment by reducing critical dimension.

Brewer Science ARC i-CON^® Coating

ARC i-CON® Coating is a highly conformal product designed to address issues of coverage and over-etch. It offers a 30% faster etch rate than most advanced i-line photoresists. This series delivers exceptional optical properties through the control of substrate reflectivity which improves CD resolution. At 0.35-µm features, the series gives excellent profiles, and has demonstrated feature sizes of 0.25 µm with PFI-88.

Brewer Science XHRiC Coating

The XHRiC coating is a highly robust product line specifically designed for advanced i-line dry patterning processes. This optical design with an n-value of 1.84 and a k-value of 0.34 gives excellent absorbance. These products have been employed in poly, gate and metalization levels for 0.30- to 0.35-µm design rule devices. With continuous improvements in lithography technologies 0.25-µm feature sizes have been resolved.

Brewer Science WiDE^®-B Coating

The WiDE®-B coating is specifically designed for wet patterning, which eliminates the need for a substrate adhesion promoter and separate BARC etch. The extended bake latitude and advanced optical characteristics allow the wet-patterning process to achieve 0.35- to 0.40-µm patterns. WiDE^®-B is especially useful as a platform for a separation layer that serves as a lift-off application in devices such as surface acoustic wave guides (SAWs).

Brewer Science WiDE^® -30W Coating

Brewer Science WiDE^® 30W anti-reflective coating is wet developable and therefore eliminates the need for a BARC etch step.  All WiDE^® anti-reflective coatings minimize CD variation by eliminating standing waves and reflective notching. This material can also be used for dry-etch systems with excellent results. WiDE^® 30W anti-reflective coating has been successfully used as a sacrificial layer for lift-off applications.

• Compatible with leading i-line resists
• High absorbance allows less than 0.01-µm CD variations over 1800 Å of topography
• Useful as a sacrificial layer in lift-off applications
• Wet developable – no impact on etch tool or cycle time
• PFOS free, for your health and the safety of the environment.

Optical Properties of the 365-nm ARC^® Product Line

Product	n	k	Cauchy A	Cauchy B	Cauchy C
ARC i-CON® Coating	1.84	0.37	1.587	1.3E-02	1.8E-03
WiDE® B Coating	1.72	0.33	1.6324	4.423E-2	-6.8E-3
WiDE® B-30W Coating	1.72	.033	1.632	4.423E-2	-6.8E-3
XHRiC Coating	1.81	0.34	1.618	9.08E-3	2.9E-3

Photoresist Compatibilities of the 365-nm ARC^® Product Line

Brewer Science 365-nm ARC^® products are compatible with all commercialized photoresists used in manufacturing.

Contact Brewer Science

For more information, fill out an inquiry form or call 573.364.0300 (US) to talk directly with a technical representative. Brewer Science welcomes the opportunity to provide quality solutions for your specific applications.

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All ARC^® products are PFOS Free, for your health and the safety of the environment.