ARC i-CON^® coating conserves etch budget and offers coverage over high topography

1:2 76% Conformality with
step coverage 210Å

1:1 72% Conformality with
step coverage 320Å

>DoF -0.4 through +0.4µ
1:1 0.35µm Feature

The ARC i-CON^® series of anti-reflective coatings have been specifically designed for superior coverage over high topography. The materials have excellent optical properties for the control of substrate reflectivity and the enhancement of CD resolution and control. ARC i-CON^® can be used to achieve feature sizes of < 0.25µm. ARC i-CON’s formulation combines the features of high conformality and faster etch rates. It has about a 30% faster etch rate than most advanced i-line photoresists.

Features:

• Reflectance on Poly Silicon with 70nm coating - < 0.5%
• 15°C bake range (185-200°C)
• ≤300nm - 350nm resolution nodes
• 90% Conformality on 5KA and 7KA topography.

Contact Brewer Science

For more information, fill out an inquiry form or call 573.364.0300 (US) to talk directly with a technical representative. Brewer Science welcomes the opportunity to provide quality solutions for your specific applications.

All ARC^® products are PFOS Free, for your health and the safety of the environment.