A proprietary solvent mixture used to remove the edge bead of photoresists and BARC materials from wafers, bowls and spin-coating equipment.
ARC® Cleaner is a proprietary solvent mixture designed to remove the edgebead of photoresist and BARC materials from wafers, spin bowl, and spin-coating equipment. This proprietary blend of solvents does not contain any caustic, nor phenolic compounds.
Brewer Science WiDE® Cleaner is a solvent mixture designed for use with WiDE® anti-reflective coating. WiDE® Cleaner can be used in a variety of applications, including edge bead removal, or to remove WiDE® material from the spin bowl. It will also dissolve uncured WiDE® material.
This proprietary blend of solvents does not contain any caustic, nor phenolic compounds.