The ARC® layer performs its function as an anti-reflective coating for CD control and then is removed as a sacrificial layer that promotes lift-off. The use of WiDE, wet developable ARC product, has an added benefit in that lift-off applications in that the ARC layer allows lift-off and removal of the metal that is deposited on the photoresist. This process is applicable for the manufacturing of Surface Acoustic Wave (SAW) guides.
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1. During the photoresist develop step, the wet develop ARC layer undercuts beneath the photoresist.
2. A metal layer is then deposited onto the photoresist.
3. Due to the ability of wet develop ARC to undercut beneath the photoresist, this enables the lift-off solvent to remove the metal coated photoresist easier. This results in leaving only the metal on the substrate. |
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Depending on your wavelength and photoresist compatibility, here are the suggested BARC products:
365nm | 436nm |
Would you like more information about thess products? Please click here to access our request form or call +573.364.0300 (U.S.A.) and request an ARC® products technical expert.
