Brewer Science, Inc., joins EMC-3D consortium to develop cost-effective 3D Thru-Silicon-Via interconnects05/03/2007Equipment and materials provider joins EMC-3D international consortium of equipment providers, materials companies and researchers to address complex integration of Thru-Silicon-Via (TSV) 3D chip interconnects. Category: Company Press Releases, R&D Press Releases, SMD Press Releases, CEE® Press Releases, ARC® Press Releases Brewer Science Releases ARC®160 Series02/26/2007Brewer Science, a leading supplier of advanced lithography materials, has released ARC®160, a ArF (193nm) anti-reflective coating that is demonstrating, as POR at large semiconductor fabricators, faster etch and dramatically lower out-gassing in the newer bake module than other ARC®<... Category: Company Press Releases, ARC® Press Releases Brewer Science Releases ARC®100 Coatings Series01/26/2007The ARC®100 coatings series is a new set of ArF bottom anti-reflective coatings (BARCs) from Brewer Science which can be modified to meet specific k-value needs. Tunable-k ARC®100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical... Category: Company Press Releases, ARC® Press Releases 65nm node processings ArF Anti-Reflective Coating ARC®29A02/18/2006Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings. Category: ARC® Product Highlight, ARC® Press Releases, Company Product Highlight "From CD to 3D: sidewall roughness and 3D metrology for sub-90nm lithography and etch."10/04/2005Grenoble, France - May 3rd, 2005 Category: Company Press Releases, ARC® Press Releases THE LITHOGRAPHY SYMPOSIUM - Grenoble03/01/2005THE LITHOGRAPHY SYMPOSIUM - Grenoble Category: ARC® Press Releases, Company Press Releases, R&D Press Releases Improve your process with the latest anti-reflective coating from Brewer Science - DUV11202/14/2005DUV112 is the latest product in Brewer Science’s BARC product family line. This product is specifically designed for certain devices that require a very low defects BARC. DUV112 has been demonstrated to have extremely high resolution, broad resist compatibility, high etch rate, excellent shelf life ... Category: Company Press Releases, ARC® Press Releases
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