Brewer Science PFOS Free Products
02/07/2005
Brewer Science activity pursues removal of PFOS from all commercialized anti-reflective coating materials.
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Company Press Releases, ARC® Press Releases, R&D Press Releases
Brewer Science® and Dow Chemical Company
Align to Unveil New Anti-Reflective Coatings for Semiconductor Industry.
10/04/2004
Brewer Science, the leader in bottom anti-reflective coatings since 1981, today announced a multi-year exclusive agreement with The Dow Chemical Company (NYSE:DOW) for the joint development of ENSEMBLE* ARC® advanced bottom anti-reflective coatings (BARCs) for the semiconductor industry. Under...
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Category:
Company Press Releases, ARC® Press Releases
ARC28 and ARC29A 193nm Anti-Reflective Coatings
10/03/2004
Introducing three new ArF anti-reflective coatings – ARC®27, ARC®28, and ARC®29A. These products offer improved optical parameters, etch characteristics and an increased depth of focus required by the current design rules. All three materials are designed for use in the ArF (193nm) photolithography ...
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Category:
Company Press Releases, ARC® Press Releases
The Anti-Reflective Coatings '04 Symposium - Albany
08/03/2004
Brewer Science is pleased to announce the Anti-Reflective Coatings '04 Symposium - Albany, New York, to be held October 28th, 2004. The goal of this symposium is to provide an opportunity for the semiconductor manufacturing community to discuss technical challenges and collaborative solutions relate...
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Category:
Company Press Releases, ARC® Press Releases, R&D Press Releases
The Anti-Reflective Coatings Symposium - Leuven
04/28/2004
The ARC® Division of Brewer Science held a technical Anti-Reflective Coatings '04 Symposium, April 28th, 2004 in Leuven, Belgium. The goal of this symposium was to provide the opportunity to explore technical topics in regard to anti-reflective coatings in the microlithography process.
Durin...
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Category:
Company Press Releases, ARC® Press Releases, R&D Press Releases
ARC i-CON®-7
The thinnest 365nm BARC in the semiconductor industry ARC i-CON®-7 for sub 0.35µ i-Line lithography.
02/09/2004
Introducing the newest and thinnest i-Line anti-reflective coating on the market, ARC i-CON-7®. This 1st minimum ARC® at 700Ĺ provides a conformal coat over topography. Improved etch selectivity of 1.4:1 to photoresist opens new frontiers in i-Line lithography.
ARC i-CON-7 reduced thi...
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Category:
Company Press Releases, ARC® Press Releases
Top 25 New Products of 2003 by MICRO Magazine
06/10/2003
IMBARC™ is a spin bowl compatible wet developable Bottom Anti-Reflective Coating [BARC] which is specially formulated for the thin photoresist implant application.
The three main advantages for using IMBARC™ in the 248nm Implant process are:
• Greater ...
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Category:
Company Press Releases, ARC® Press Releases
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