Brewer Science activity pursues removal of PFOS from all commercialized anti-reflective coating materials.
Category: Company Press Releases, ARC® Press Releases, R&D Press Releases
Brewer Science, the leader in bottom anti-reflective coatings since 1981, today announced a multi-year exclusive agreement with The Dow Chemical Company (NYSE:DOW) for the joint development of ENSEMBLE* ARC® advanced bottom anti-reflective coatings (BARCs) for the semiconductor industry. Under...
Category: Company Press Releases, ARC® Press Releases
Introducing three new ArF anti-reflective coatings – ARC®27, ARC®28, and ARC®29A. These products offer improved optical parameters, etch characteristics and an increased depth of focus required by the current design rules. All three materials are designed for use in the ArF (193nm) photolithography ...
Category: Company Press Releases, ARC® Press Releases
Brewer Science is pleased to announce the Anti-Reflective Coatings '04 Symposium - Albany, New York, to be held October 28th, 2004. The goal of this symposium is to provide an opportunity for the semiconductor manufacturing community to discuss technical challenges and collaborative solutions relate...
Category: Company Press Releases, ARC® Press Releases, R&D Press Releases
The ARC® Division of Brewer Science held a technical Anti-Reflective Coatings '04 Symposium, April 28th, 2004 in Leuven, Belgium. The goal of this symposium was to provide the opportunity to explore technical topics in regard to anti-reflective coatings in the microlithography process.
Durin...
Category: Company Press Releases, ARC® Press Releases, R&D Press Releases
Introducing the newest and thinnest i-Line anti-reflective coating on the market, ARC i-CON-7®. This 1st minimum ARC® at 700Ĺ provides a conformal coat over topography. Improved etch selectivity of 1.4:1 to photoresist opens new frontiers in i-Line lithography.
ARC i-CON-7 reduced thi...
Category: Company Press Releases, ARC® Press Releases
IMBARC™ is a spin bowl compatible wet developable Bottom Anti-Reflective Coating [BARC] which is specially formulated for the thin photoresist implant application.
The three main advantages for using IMBARC™ in the 248nm Implant process are:
• Greater ...
Category: Company Press Releases, ARC® Press Releases
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