Equipment and materials provider joins EMC-3D international consortium of equipment providers, materials companies and researchers to address complex integration of Thru-Silicon-Via (TSV) 3D chip interconnects.
Category: Company Press Releases, R&D Press Releases, SMD Press Releases, CEE® Press Releases, ARC® Press Releases
Brewer Science, a leading supplier of advanced lithography materials, has released ARC®160, a ArF (193nm) anti-reflective coating that is demonstrating, as POR at large semiconductor fabricators, faster etch and dramatically lower out-gassing in the newer bake module than other ARC®<...
Category: Company Press Releases, ARC® Press Releases
The ARC®100 coatings series is a new set of ArF bottom anti-reflective coatings (BARCs) from Brewer Science which can be modified to meet specific k-value needs. Tunable-k ARC®100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical...
Category: Company Press Releases, ARC® Press Releases
Brewer Science is continuing the twenty-five year promise to provide solutions to our leading edge cusotmers by announcing the release of ARC®29A to aid in the flexibility of photoresist compatibility when paired with anti-reflective coatings.
ArF (193nm) Processing
• Used in the man...
Category: ARC® Product Highlight, ARC® Press Releases, Company Product Highlight
Grenoble, France - May 3rd, 2005
Category: Company Press Releases, ARC® Press Releases
THE LITHOGRAPHY SYMPOSIUM - Grenoble
May 3rd, 2005
Grenoble, France
Brewer Science is pleased to announce THE LITHOGRAPHY SYMPOSIUM, Grenoble France, to be held May 3rd, 2005. The goal of this symposium is to provide an opportunity for the semiconductor manufacturing community to discus...
Category: ARC® Press Releases, Company Press Releases, R&D Press Releases
DUV112 is the latest product in Brewer Science’s BARC product family line. This product is specifically designed for certain devices that require a very low defects BARC. DUV112 has been demonstrated to have extremely high resolution, broad resist compatibility, high etch rate, excellent shelf life ...
Category: Company Press Releases, ARC® Press Releases