WiDE®B 365nm Anti-Reflective Coating

WiDE®B was developed as a wet developable i-line bottom anti-reflective coating that eliminates the need for a BARC etch step. The extended bake latitude and advanced optical characteristics of the WiDE series allow use of a wet develop process in the sub half micron region. WiDE anti-reflective coatings minimize CD variation by elimination of standing waves and reflective notching. This material can also be used for dry etch systems with excellent results. WiDE has been successfully used as a sacrificial layer for lift-off applications.

Features:

• Compatible with leading i-line resists
• Sub 0.5µm wet patterning capable
• High absorbance allows less than 0.01µm variations over 1800Å topography
• Useful as a sacrificial layer in lift off applications
• Wet developable – no impact on etch tool or cycle time
• 10°C bake temperature range for 0.35µm geometry
• Able to perform as a dry etch BARC as well.

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