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This family of products, developed for g, h and i-line lithography, is designed to develop simultaneously with the resist in aqueous base developer or by dry etch processing.
XLT-B products feature increased processing latitude and high absorbency levels to extend the BARC process into the sub-micron region. These features help provide increased CD control and eliminate standing waves and reflective notching.
Need more information about this product? Please click here to access our request form or call +573.364.0300 (U.S.A.) and request an ARCŪ products technical expert.
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