DBARC TechnologiesDeveloper-soluble bottom anti-reflective coatings
Typical bottom anti-reflective coatings (BARCs) require a separate etch step to be removed after the photoresist has been developed. This can damage the substrate if the BARC open etch extends beyond the BARC. During this etch step, some of the remaining photoresist is also etched away. When the substrate is sensitive or the amount of photoresist that can be sacrificed during this step (etch budget) is limited, the ability to develop the BARC away with the photoresist becomes an attractive option. Using a developer-soluble BARC (DBARC) has many benefits, including:
- Simultaneously develops with photoresist which eliminates impact of BARC plasma etch step
- Substrate preservation
- Increases tool uptime with low sublimation
- Reduces CD variation versus TARC
- Provides flexibility in resist selection
Brewer Science® DBARC Products
ARC® DS-A520 Photosensitive Developer-Soluble 193-nm BARC (ArF PS-DBARC)
ARC® DS-A520 coating is a photosensitive developer-soluble bottom anti-reflective coating that is specially formulated to meet the needs of ArF photolithography and augments processes where the resist budget is limited. The use of a developer soluble BARC enables processes where underlying substrates may sustain damage from a reactive ion etch (RIE) and can also improve throughput in other applications by eliminating the BARC open RIE step which reduces the cost of ownership.
ARC® DS-K101 Coating
Brewer Science® ARC® DS-K101 is specially formulated to meet the needs of KrF photoligraphy for a BARC and to augment the effectiveness of the thin photoresist used in implant applications. The use of a developer-soluble BARC can improve throughput while reducing the cost of ownership of DUV processing. ARC® DS-K101 coating can be used in FEOL and BEOL applications where a traditional BARC is used such as:
- Ion implant
- High-k metal gates
- Works with standard lithography processing tools.
Brewer Science® WiDE®-C coating is specifically designed for wet patterning, which eliminates the need for a substrate adhesion promoter and separate BARC etch. The extended bake latitude and advanced optical characteristics allow the wet-patterning process to achieve 0.35- to 0.40-µm patterns. WiDE®-C is especially useful as a platform for a separation layer that serves as a lift-off application in devices such as surface acoustic wave guides (SAWs).
Brewer Science® WiDE® 30W anti-reflective coating is wet developable and therefore eliminates the need for a BARC etch step. All WiDE® anti-reflective coatings minimize CD variation by eliminating standing waves and reflective notching. This material can also be used for dry-etch systems with excellent results. WiDE® 30W anti-reflective coating has been successfully used as a sacrificial layer for lift-off applications.
- Compatible with leading i-line resists
- High absorbance allows less than 0.01-µm CD variations over 1800 Å of topography
- Useful as a sacrificial layer in lift-off applications
- Wet developable - no impact on etch tool or cycle time
- PFOS free, for your health and the safety of the environment.