ARC® 100-Series 193-nm (ArF)
ARC® 100 Coating Series provides broad photoresist compatibility with ultra low outgassing performance. ARC® 100-series coatings are modifiable to meet a specific k value. Tunable-k ARC® 100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical requirements needed for optimal substrate reflectivity control. BARCs with k values range from 0.13 to 0.47 can be manufactured using the same chemical backbones, to produce a product designed to match the reflectivity control requirements for your stack.
Benefits Include:
ASML results: ARC® 100 coating - Resist A
Low iso/dense bias for via and trench filling applications
Benefits Include:
- Increase flexibility in photoresist selections
- Increase tool uptime due to ultra low outgassing
- Conserve etch budget with a fast, dry etching BARC
- Apply in both FEOL and BEOL processes
ASML results: ARC® 100 coating - Resist A
Low iso/dense bias for via and trench filling applications