ARC® 29SR 193-nm (ArF)
ARC® 29SR coating is a leading anti-reflective coating for 193-nm photolithography. This 2nd minimum material is compatible with a broad range of ArF photoresists. It is available in formulations for 200-mm and 300-mm processes.
- Increase tool uptime due to improved outgassing performance
- Decrease defectivity with improved EBR compatibility in immersion processes
- Increase flexibility in photoresist selection with the almost universal resist compatibility