DUV 96 248-nm (KrF)
DUV 96 coating conserves etch budget and
increases process flexibility with
photoresist selection in 248-nm lithography
Benefits Include:
Benefits Include:
- Conserve etch budget with this fast etching, thin 248-nm BARC
- Increase flexibility in photoresist selections: Compatible with acetal and ESCAP type resists
- Use in both FEOL and BEOL processes
