365-nm (i-Line) Products
The Brewer Science 365-nm product line of anti-reflective coatings aids the manufacturer in extending the usability of capital equipment by reducing critical dimension.
ARC i-CON® Coating
Brewer Science® ARC i-CON® Coating is a highly conformal product designed to address issues of coverage and over-etch. It offers a 30% faster etch rate than most advanced i-line photoresists. This series delivers exceptional optical properties through the control of substrate reflectivity which improves CD resolution. At 0.35-µm features, the series gives excellent profiles, and has demonstrated feature sizes of 0.25 µm with PFI-88.
Brewer Science ® XHRiC coating is a highly robust product line specifically designed for advanced i-line dry patterning processes. This optical design with an n-value of 1.84 and a k-value of 0.34 gives excellent absorbance. These products have been employed in poly, gate and metalization levels for 0.30- to 0.35-µm design rule devices. With continuous improvements in lithography technologies 0.25-µm feature sizes have been resolved.
Photoresist Compatibilities of the 365-nm ARC® Product Line
Brewer Science 365-nm ARC® products are compatible with all commercialized photoresists used in manufacturing.