Organic... it's the natural choice


Photo: Example of CVD topography, post CMP, built into the device

Inorganic CVD BARCs limit your process window by the diminished focus latitude caused by the sub-structure topography.

Click image to enlarge

At the ≤90nm node the lithographer can increase the process window by using a sacrificial layer of spin-on organic ARC® products as evidenced by the following graphs:

As you can see in the expanded section of the simulation graph to the left:
• The CVD BARC "SiON" (black line) in the nominal 90nm range has between a 6 to 10nm shift for a 20nm photoresist thickness change.
• The organic spin-on ARC® product (red line) has between a 1 to 5nm shift for a 30nm photoresist thickness change.
• And the combination of SiON & ARC® product (orange line) has between a 2 to 7nm shift for a 30nm photoresist thickness change.

The Organic Benefit

The benefit of the reduced swing curve obtained by using our spin-on organic ARC® products:

  • Your process window will be increased by allowing greater photoresist thickness changes while maintaining the 5% critical dimension range.
  • Etch budget savings - ARC® products etch at an order of magnitude faster than CVD BARCs.

0% Reflectance with Organic ARC® Products

Click to enlarge.

As you can see in the simulated reflectivity graph, our organic spin-on ARC® products easily provide 0% reflectivity, whereas no matter the thickness, SiON never reaches 0% reflectivity.

CPK Projection

What does 0% reflectivity mean to my process window? As an example of how substrate reflectivity relates to the overall critical dimension of the device please examine the CPK chart to the right.

The goal of incorporating spin-on organic ARC® products into your process is to manufacture stable critical dimension as simulated in the CPK Projections graph.

Why are Brewer Science's Organic ARC® products superior to the competition?

ARC® products are sacrificial spin-on coatings that provide reflectivity control during photoresist exposure, resulting in reduced CD swing and wider process window. Brewer Science ARC® products facilitate not only efficient photolithography and enable easy etch integration, each product is backed by superior technical support and service.

All ARC® products are PFOS Free, for your health and the safety of the environment.