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Organic... it's the natural choice

Inorganic CVD BARCs limit your process window by the diminishing the focus latitude. This is due to the sub-structure topography:

Organic Chemical Vapor Deposition topography
Example of CVD topography, post CMP,
built into the device

At the 90-nm node the lithographer can increase the process window by using a sacrificial layer of spin-on organic ARC® products:

Organic Critical Dimensions variation

As you can see in the simulation graph above:

  • The CVD BARC "SiON" (black line) in the nominal 90 nm range has between a 6- to 10-nm shift for a 20-nm photoresist thickness change.
  • The organic spin-on ARC® product (red line) has a 1- to 5-nm shift for a 30-nm photoresist thickness change.
  • And the combination of SiON & ARC® product (orange line) has between a 2 to 7nm shift for a 30-nm photoresist thickness change.

The Organic Benefit

The benefit of the reduced swing curve obtained by using our spin-on organic ARC® products:

  • Your process window will be increased by allowing greater photoresist thickness changes while maintaining the 5% critical dimension range.
  • Etch budget savings - ARC® products etch at an order of magnitude faster than CVD BARCs.

0% Reflectance with Organic ARC® Products

Organic Substrate Reflectivity

As you can see in the simulated reflectivity graph, our organic spin-on ARC® products easily provide 0% reflectivity, whereas no matter the thickness, SiON never reaches 0% reflectivity.

CPK Projection

What does 0% reflectivity mean to your process window? The CPK chart below is an example of how substrate reflectivity relates to the overall critical dimension of the device.

Organic Low Reflectivity

The goal of incorporating spin-on organic ARC® products into your process is to manufacture stable critical dimension as simulated in the CPK Projections graph.

Why are Brewer Science Organic ARC® products superior to the competition?

ARC® products are sacrificial spin-on coatings that provide reflectivity control during photoresist exposure, resulting in reduced CD swing and wider process window. Brewer Science ARC® products facilitate not only efficient photolithography and enable easy etch integration, each product is backed by superior technical support and service.

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