OptiStack® Multilayer Systems
Brewer Science® OptiStack® systems are industry proven lithography solutions designed to save you time and money and increase return on your lithography investment.
Enabling the progression of Moore’s law beyond 20 nm, Brewer Science® OptiStack® systems are the leading choice for advanced lithography. These systems offer customized platforms for specific processing conditions. OptiStack® systems simplify the overall lithography process by offering a universal lithography platform that eliminates topography dispersion and maintains optimal optical interfaces in the same focal plane, regardless of the substrate optical properties.
Simplify the overall lithography process
OptiStack® systems simplify the overall lithography process by offering a universal lithography platform that eliminates topography dispersion and maintains optimal optical interfaces in the same focal plane, regardless of the substrate optical properties. This design helps simplify inventory management for our customers because it allows them to process multiple layers using a much narrower set of materials. This technology also helps customers by enabling them to broaden their design rules, increase their speed of design, and simplify their optical proximity correction (OPC) calculation because the same reflectivity is maintained on multiple layers.
Extend resolution limits of existing tools
OptiStack® systems allow customers to use thin resist technology, which will extend the resolution limits of their existing photolithography tool. While the expanded etch capability needed for multilayer processing may require an additional capital investment, this expense is minimal compared to upgrading to the next generation of scanners.
- Support through modeling using OptiStack® simulation software
- Proven technology to use with thin resists, which will extend the resolution limits of existing photolithography tool sets
- Variable n and k with the OptiStack® HM800 series
- Easy re-workability with the OptiStack® HM800 series
- The ability to use the same material set for both KrF and ArF exposure
- Improved BEOL throughput
- Easy wet stripping from delicate substrates with the OptiStack® SOC300 series
OptiStack® Stack Modeling Service
Customizes BARC material for customer stack and reduce experimental time and cost with OptiStack® Stack Modeling Service
General Questions & Comments
Optistack® Simulation System
Minimum reflectance does not guarantee optimal litho results when using high NA tools:
Brewer Science® OptiStack® simulation tool is a service available exclusively through Brewer Science. We have developed this modeling system to quickly determine optimum ARC® product recommendations to match your substrate stack and topography, and to reduce time and money spent on material screening tests.
With the new regime of hyper-NA exposure tools, optimizing solely for minimum reflectivity does not give the best resist profile and process window possible. The OptiStack® simulation tool can be used to examine the optical interference of the substrate reflection and predict processing conditions to compensate for chemical interactions using improved optical UV distribution at the foot of the resist.