OptiStack^® simulation tool is a service available exclusively through Brewer Science. We have developed this modeling system to quickly determine optimum ARC^® product recommendations to match your substrate stack and topography, and to reduce time and money spent on material screening tests.

With the new regime of hyper-NA exposure tools, optimizing solely for minimum reflectivity does not give the best resist profile and process window possible. The OptiStack^® simulation tool can be used to examine the optical interference of the substrate reflection and predict processing conditions to compensate for chemical interactions using improved optical UV distribution at the foot of the resist.

Minimum reflectance does not guarantee optimal litho results when using high NA tools:

Learn more at Microlithography World Online (Opens in New Window)