With the new regime of hyper-NA exposure tools, optimizing solely for minimum reflectivity does not give the best resist profile and process window possible. The OptiStack^® simulation tool has been developed to examine the optical interference of the substrate reflection and predict processing conditions to compensate for chemical interactions using improved optical UV distribution at the foot of the resist.

Minimum reflectance does not guarantee optimal litho results when using high NA tools

Customizes BARC material for customer stack and reduces experimental time and cost

Learn more... (you will be redirected to Microlithography World online)