193-nm (ArF) Anti-Reflective Coatings
The 193-nm reduced feature sizes challenge is being met with our newest line of anti-reflective coatings, designed to meet the emerging needs of the 193-nm photo process.
Brewer Science ARC®162 Coating
ARC®162 coating - Avoid unscheduled maintenance of your coat/bake module by reducing out-gassing during BARC bake by making ARC®162 coating your fast-etch process of record.
Brewer Science ARC® 100 Coating
ARC® 100 coatings are a series of 193-nm BARCs from Brewer Science that are modifiable to meet a specific k value. Tunable-k ARC® 100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical requirements needed for optimal substrate reflectivity control. BARCs with k values range for 0.13 - 0.47 can be manufactured using the same chemical backbones, to produce a product designed to match the reflectivity control requirements for your stack.
Brewer Science ARC® 91 Coating
ARC® 91 coating is an ArF BARC that is designed to meet the advanced lithography needs. Its high optical k constant makes it an ideal candidate as a bottom layer dual layer BARC patterning for hyper NA lithography. It is also useful as a barrier film to minimize resist poisoning.
- Low reflectivity on Si and SiN substrates
- Minimum reflectivity at 310 Å on Si
- Broad compatibility with 193-nm photo-resist
- Performance in a wide range of bake temperatures
- Enhanced optical performance
Brewer Science ARC® 29SR Coating
ARC® 29SR coating is a leading anti-reflective coating for 193-nm photolithography. This 2nd minimum material is compatible with a broad range of ArF photoresists. It is available in formulations for 200-mm and 300-mm processes.
Contact Brewer Science
For more information, fill out an inquiry form or call 573.364.0300 (US) to talk directly with a technical representative. Brewer Science welcomes the opportunity to provide quality solutions for your specific applications.
All ARC® products are PFOS Free, for your health and the safety of the environment.