The challenge of reduced feature sizes is being met with our newest line of anti-reflective coatings, designed to meet the emerging needs of the 193-nm photo process.

ARC^® 300 System

A single-platform ARC^® material with variable n & k values to suit your needs.

• Variable n & k for dry and immersion lithography
• Useful as a single-layer BARC on absorbing substrates, on reflective substrates, or as a dual-layer BARC platform
• Single platform for a variety of different layer needs

ARC^® 162B Coating

Avoid unscheduled maintenance of your coat/bake module by making ARC^® 162B coating your low-outgassing, fast-etch process of record.

ARC^® 100-Series Coatings

ARC^® 100-series coatings are a series of 193-nm BARCs that are modifiable to meet a specific k value. Tunable-k ARC^® 100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical requirements needed for optimal substrate reflectivity control. BARCs with k values range from 0.13 to 0.47 can be manufactured using the same chemical backbones, to produce a product designed to match the reflectivity control requirements for your stack.

ARC^® 29SR Coating

ARC^® 29SR coating is a leading anti-reflective coating for 193-nm photolithography. This 2nd minimum material is compatible with a broad range of ArF photoresists. It is available in formulations for 200-mm and 300-mm processes.