248-nm (KrF) Anti-Reflective Coatings
The 248-nm product line extends the useable life of your DUV equipment into the sub 0.10-µm range for critical dimension.
Developer Soluble Anti-Reflective Coating
Brewer Science ARC® DS-K101 is specially formulated to meet the needs of KrF photoligraphy for a BARC and to augment the effectiveness of the thin photoresist used in implant applications. The use of a developer-soluble BARC can improve throughput while reducing the cost of ownership of DUV processing.
Brewer Science® ESCAP Photoresist Compatible ARC® Materials
DUV 252 Coating
The DUV 252 coating is specifically designed to be compatible with ESCAP DUV photoresists and for use in the dual damascene process. Their planarizing characteristics ensure better control of resist thickness over steps to minimize reflective notching and improve CD control.
DUV 112 Coating
The DUV 112 coating is specifically designed for certain devices that require a very low defect BARC. DUV 112 coating has demonstrated to have extremely high resolution, broad resist compatibility, high etch rate, excellent shelf life in normal storage conditions and easy to process.
Brewer Science DUV 42S Family
DUV 42S coating is compatible with ESCAP photoresists. DUV 42S utilizes a conformal design and an increased etch rate while optimizing step coverage. DUV 42S coating is optimized to meet the requirements of the < 0.10-µm design rule.
Brewer Science® Acetal Photoresist Compatible ARC® Material
DUV 54 Coating
DUV 54 coating is designed for use in dual damascene processes and is compatible with Acetal DUV photoresists. Its planarizing characteristics ensure the ability to acheive better control of resist thickness over steps to minimize reflective notching and improve CD control.
DUV 44 Coating
DUV 44 coating is designed for < 0.18-µm design rules. DUV 44 demonstrates excellent profiles with a broad range of Acetal photoresists. This product provides a planar, fast etching BARC layer.
Optical Properties of the 248-nm ARC® Product Line
|
Brewer Science Product |
n |
k |
Cauchy A |
Cauchy B |
Cauchy C |
|
DUV 252 Coating |
1.48 |
0.43 |
1.55 |
1.33E-02 |
0.0 |
|
DUV 112 Coating |
1.48 |
0.42 |
1.55 |
5.66E-03 |
1.24E-03 |
|
DUV 54 Coating |
1.54 |
0.45 |
1.56 |
1.10E-3 |
0.00E+0 |
|
DUV 44 Coating |
1.48 |
0.41 |
1.55 |
5.66E-3 |
1.24E-3 |
|
DUV 42S Coating |
1.48 |
0.41 |
1.55 |
5.66E-3 |
1.24E-3 |
Photoresist Compatibilities of the 248-nm ARC® Product Line
|
Product |
Acetal |
ESCAP |
Hybrid |
Via Fill |
|
DUV 252 Coating |
|
√ |
|
√ |
|
DUV 112 Coating |
|
√ |
√ |
|
|
DUV 54 Coating |
√ |
|
√ |
|
|
DUV 44 Coating |
√ |
|
|
|
|
DUV 42S Coating |
|
√ |
|
|
Contact Brewer Science
For more information, fill out an inquiry form or call 573.364.0300 (US) to talk directly with a technical representative. Brewer Science welcomes the opportunity to provide quality solutions for your specific applications.
All ARC® products are PFOS Free, for your health and the safety of the environment.